Spectroscopic study on rotational and vibrational temperature of N{sub 2} and N{sub 2}{sup +} in dual-frequency capacitively coupled plasma

Xiaojiang, Huang; Yu, Xin; Lei, Yang; Quanhua, Yuan; Zhaoyuan, Ning

doi:10.1063/1.3025826

Title: Spectroscopic study on rotational and vibrational temperature of N{sub 2} and N{sub 2}{sup +} in dual-frequency capacitively coupled plasma

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Abstract

By using optical emission spectroscopy, the vibrational and rotational temperatures of N{sub 2} and N{sub 2}{sup +} in capacitively coupled plasma (CCP) discharges driven by dual-frequency 41 MHz and 2 MHz are investigated. The vibrational and rotational temperatures are measured based on the N{sub 2}{sup +} first negative system and N{sub 2} second positive system overlapped molecular emission optical spectrum, using the method of comparing the measured and calculated spectra with a least-square procedure. The influence of the rotational and vibrational temperatures with input power of the high frequency (HF) and low frequency (LF) as well as the gas pressure is discussed. It is found that the vibrational or rotational temperatures of N{sub 2} and N{sub 2}{sup +} are decoupled in dual-frequency CCP discharge. The influence of the LF power on N{sub 2}{sup +} rotational and vibrational temperature is much more than that of N{sub 2}, while the influence of HF power is just opposite to the case of LF power. The reason for this is thought to be the variation of electron temperature when applying HF or LF power. Additionally, the increase of gas pressure makes the difference between the vibrational and rotational temperature decrease.

Authors:

Xiaojiang, Huang; Yu, Xin; Lei, Yang; Quanhua, Yuan; Zhaoyuan, Ning ^[1]

Jiangsu Key Laboratory of Thin Films, School of Physical Science and Technology, Soochow University, Suzhou 215006 (China)

Publication Date:: Sat Nov 15 00:00:00 EST 2008

OSTI Identifier:: 21259683

Resource Type:: Journal Article

Journal Name:: Physics of Plasmas

Additional Journal Information:: Journal Volume: 15; Journal Issue: 11; Other Information: DOI: 10.1063/1.3025826; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 1070-664X

Country of Publication:: United States

Language:: English

Subject:: 70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ELECTRIC DISCHARGES; ELECTRON TEMPERATURE; EMISSION SPECTROSCOPY; LEAST SQUARE FIT; PLASMA; PLASMA DIAGNOSTICS; SPECTRA

Citation Formats


                    Xiaojiang, Huang, Yu, Xin, Lei, Yang, Quanhua, Yuan, and Zhaoyuan, Ning. Spectroscopic study on rotational and vibrational temperature of N{sub 2} and N{sub 2}{sup +} in dual-frequency capacitively coupled plasma.  United States: N. p., 2008. 
        Web.  doi:10.1063/1.3025826.

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                    Xiaojiang, Huang, Yu, Xin, Lei, Yang, Quanhua, Yuan, & Zhaoyuan, Ning. Spectroscopic study on rotational and vibrational temperature of N{sub 2} and N{sub 2}{sup +} in dual-frequency capacitively coupled plasma.  United States.  https://doi.org/10.1063/1.3025826

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                    Xiaojiang, Huang, Yu, Xin, Lei, Yang, Quanhua, Yuan, and Zhaoyuan, Ning. 2008.  
        "Spectroscopic study on rotational and vibrational temperature of N{sub 2} and N{sub 2}{sup +} in dual-frequency capacitively coupled plasma".  United States.  https://doi.org/10.1063/1.3025826.

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@article{osti_21259683,

  title        = {Spectroscopic study on rotational and vibrational temperature of N{sub 2} and N{sub 2}{sup +} in dual-frequency capacitively coupled plasma},

  author       = {Xiaojiang, Huang and Yu, Xin and Lei, Yang and Quanhua, Yuan and Zhaoyuan, Ning},

  abstractNote = {By using optical emission spectroscopy, the vibrational and rotational temperatures of N{sub 2} and N{sub 2}{sup +} in capacitively coupled plasma (CCP) discharges driven by dual-frequency 41 MHz and 2 MHz are investigated. The vibrational and rotational temperatures are measured based on the N{sub 2}{sup +} first negative system and N{sub 2} second positive system overlapped molecular emission optical spectrum, using the method of comparing the measured and calculated spectra with a least-square procedure. The influence of the rotational and vibrational temperatures with input power of the high frequency (HF) and low frequency (LF) as well as the gas pressure is discussed. It is found that the vibrational or rotational temperatures of N{sub 2} and N{sub 2}{sup +} are decoupled in dual-frequency CCP discharge. The influence of the LF power on N{sub 2}{sup +} rotational and vibrational temperature is much more than that of N{sub 2}, while the influence of HF power is just opposite to the case of LF power. The reason for this is thought to be the variation of electron temperature when applying HF or LF power. Additionally, the increase of gas pressure makes the difference between the vibrational and rotational temperature decrease.},

  doi          = {10.1063/1.3025826},

  url          = {https://www.osti.gov/biblio/21259683},
  journal      = {Physics of Plasmas},

  issn         = {1070-664X},

  number       = 11,

  volume       = 15,

  place        = {United States},

  year         = {Sat Nov 15 00:00:00 EST 2008},

  month        = {Sat Nov 15 00:00:00 EST 2008}

}

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