Effect Of The Plasma Deposition Parameters On The Properties Of Ti/TiN Multilayers For Hard Coatings Applications
- CDTA, DMIL, Plasma Discharges Group, PO Box 17 Baba hassen, Algiers (Algeria)
- USTHB, LECTCM, PO. Box 32 El Alia, BabEzzouar, Algiers (Algeria)
In this study, we present the effect of the plasma deposition parameters on the mechanical properties of Ti/TiN multilayers. The elaboration of our films has been carried out by RF-Magnetron Sputtering (13.56 MHz) under nitrogen and argon reactive plasma at low pressure. The film depositions have been done on steel substrates. The first step of our study was the optimization of the depositions conditions in order to obtain good quality films. The amount of nitrogen in the sputtering gases being fixed at 10%. The total pressure was set between 2mTorr to 10mTorr. The deposited multilayers were characterized by X-ray diffraction (XRD), energy dispersive spectroscopy (EDS), atomic force microscopy (AFM) and micro-indentation.
- OSTI ID:
- 21251403
- Journal Information:
- AIP Conference Proceedings, Vol. 1047, Issue 1; Conference: LAPAMS'08: 1. international conference on laser plasma applications in materials science, Algiers (Algeria), 23-26 Jun 2008; Other Information: DOI: 10.1063/1.2999950; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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