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Title: Characterization Of Fe{sub 1-x}Co{sub x}Si Thin Films Deposited Via Pulsed Laser Deposition

Abstract

We report on the structural and morphological characterization of B20 cubic structure Fe{sub 1-x}Co{sub x}Si thin films grown by pulsed laser deposition for the concentration range 0{<=}x{<=}0.3 deposited on Si (111) substrate. The x-ray diffraction, Rutherford back scattering (RBS), Scanning Electron microscopy (SEM) and Atomic force microscopy (AFM) of the films show that all the films are single phase B20 cubic structure with concentrations close to expected values, very smooth and dense with surface roughness less than 0.8 nm.

Authors:
 [1]; ; ; ;  [2];  [3]
  1. Department of Physics and Electronics, National University of Lesotho, P.O. Roma 180, Maseru (Lesotho)
  2. Nano-Sciences Laboratories, Materials Research Group, iThemba LABS, National Research Foundation, Somerset West (South Africa)
  3. Department of Physics and Astronomy, Louisiana State University, Baton Rouge, LA 70803 (United States)
Publication Date:
OSTI Identifier:
21251384
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 1047; Journal Issue: 1; Conference: LAPAMS'08: 1. international conference on laser plasma applications in materials science, Algiers (Algeria), 23-26 Jun 2008; Other Information: DOI: 10.1063/1.2999915; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ATOMIC FORCE MICROSCOPY; BACKSCATTERING; COBALT; CUBIC LATTICES; ENERGY BEAM DEPOSITION; INTERMETALLIC COMPOUNDS; IRON; LASER RADIATION; PULSED IRRADIATION; ROUGHNESS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; SURFACES; THIN FILMS; X-RAY DIFFRACTION

Citation Formats

Manyala, N., Ngom, Balla, Kana-Kana, J. B., Bucher, Remy, Maaza, M., and Di Tusa, J. F. Characterization Of Fe{sub 1-x}Co{sub x}Si Thin Films Deposited Via Pulsed Laser Deposition. United States: N. p., 2008. Web. doi:10.1063/1.2999915.
Manyala, N., Ngom, Balla, Kana-Kana, J. B., Bucher, Remy, Maaza, M., & Di Tusa, J. F. Characterization Of Fe{sub 1-x}Co{sub x}Si Thin Films Deposited Via Pulsed Laser Deposition. United States. doi:10.1063/1.2999915.
Manyala, N., Ngom, Balla, Kana-Kana, J. B., Bucher, Remy, Maaza, M., and Di Tusa, J. F. Tue . "Characterization Of Fe{sub 1-x}Co{sub x}Si Thin Films Deposited Via Pulsed Laser Deposition". United States. doi:10.1063/1.2999915.
@article{osti_21251384,
title = {Characterization Of Fe{sub 1-x}Co{sub x}Si Thin Films Deposited Via Pulsed Laser Deposition},
author = {Manyala, N. and Ngom, Balla and Kana-Kana, J. B. and Bucher, Remy and Maaza, M. and Di Tusa, J. F.},
abstractNote = {We report on the structural and morphological characterization of B20 cubic structure Fe{sub 1-x}Co{sub x}Si thin films grown by pulsed laser deposition for the concentration range 0{<=}x{<=}0.3 deposited on Si (111) substrate. The x-ray diffraction, Rutherford back scattering (RBS), Scanning Electron microscopy (SEM) and Atomic force microscopy (AFM) of the films show that all the films are single phase B20 cubic structure with concentrations close to expected values, very smooth and dense with surface roughness less than 0.8 nm.},
doi = {10.1063/1.2999915},
journal = {AIP Conference Proceedings},
number = 1,
volume = 1047,
place = {United States},
year = {Tue Sep 23 00:00:00 EDT 2008},
month = {Tue Sep 23 00:00:00 EDT 2008}
}