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Title: Nanoscale piezoresponse studies of ferroelectric domains in epitaxial BiFeO{sub 3} nanostructures

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3055412· OSTI ID:21190072
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  1. Materials Science Division, Argonne National Laboratory, 9700 South Cass Avenue, Lemont, Illinois 60439 (United States)
  2. Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Yuseong-gu, Daejeon 305701 (Korea, Republic of)

We report the dependence of the ferroelectric domain configuration and switching behavior on the shape (square versus round) of epitaxial BiFeO{sub 3} (BFO) nanostructures. We fabricated (001) oriented BFO(120 nm)/SrRuO{sub 3}(SRO,125 nm) film layers on (001) SrTiO{sub 3} single crystals by rf magnetron sputter deposition, and patterned them to square (500x500 nm{sup 2}) and round (502 nm in diameter) shaped nanostructures by focused ion-beam lithography. The surface morphology and the crystalline structure of the nanostructures were characterized by scanning electron microscopy and x-ray diffraction, respectively, while the domain configuration was investigated using piezoelectric force microscopy. We found that the square-shaped nanostructures exhibit a single variant domain configuration aligned along the [111] direction, whereas the round-shaped nanostructures exhibit seven variants of domain configuration along the [111], [111], [111], [111], [111], [111], and [111] directions. Moreover, local d{sub 33} piezoelectric coefficient measurements showed hysteresis loops with a strong displacement in the voltage axis (strong imprint) for the square-shaped nanostructures, while the round-shaped ones exhibited more symmetric loops. These findings have critical implications for the development of nanocapacitors for gigabyte to terabyte nonvolatile ferroelectric memories.

OSTI ID:
21190072
Journal Information:
Journal of Applied Physics, Vol. 105, Issue 6; Other Information: DOI: 10.1063/1.3055412; (c) 2009 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English