Infrared analysis of hole properties of Mg-doped p-type InN films
- Graduate School of Electrical and Electronics Engineering, Venture Business Laboratory, Chiba University, 1-33 Yayoicho, Inage-ku, Chiba 263-8522 (Japan)
Mg-doped InN films grown by plasma-assisted molecular beam epitaxy were characterized by infrared reflectance. Signatures of p-type conductivity in the spectra were obtained in the same doping density range where the existence of net acceptors was found by electrolyte capacitance-voltage measurements. Numerical spectrum analysis, which takes into account the large broadening factor of the normal mode energies of longitudinal optical phonon-plasmon coupling yielded high hole densities in the range of (0.1-1.2)x10{sup 19} cm{sup -3} and optical mobilities in the range of 25-70 cm{sup 2}/V s.
- OSTI ID:
- 21175802
- Journal Information:
- Applied Physics Letters, Vol. 93, Issue 23; Other Information: DOI: 10.1063/1.3006052; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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