Photoelectrochemical and physical properties of tungsten trioxide films obtained by aerosol pyrolysis

Journal Article · Tue Jun 03 00:00:00 EDT 2008 · Materials Research Bulletin

DOI:https://doi.org/10.1016/j.materresbull.2007.06.035· OSTI ID:21144022

Sadale, S B; Chaqour, S M; Gorochov, O ^[1]

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1. Groupe d'etude de la matiere condensee, C.N.R.S. 1, place Aristide Briand, F-92195 Meudon CEDEX (France)

Aerosol pyrolysis (AP) was used for preparing semiconducting films of tungsten trioxide using peroxotungstic acid as a precursor. The films were characterized by SEM, XRD, and by their photoelectrochemical response. Porous, polycrystalline (monoclinic) films of thickness up to 3 {mu}m were prepared. An incident photon to current efficiency (IPCE) of 0.55 at 365 nm was obtained for films of 1 {mu}m thickness on conducting F:SnO{sub 2}/glass substrates under depletion conditions, in junctions with aqueous electrolytes. The spectral (photocurrent) response extended into the visible region (up to 470 nm) which is of importance for solar applications like photocatalysis.

• OSTI ID: 21144022
• Journal Information: Materials Research Bulletin, Vol. 43, Issue 6; Other Information: DOI: 10.1016/j.materresbull.2007.06.035; PII: S0025-5408(07)00281-4; Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved; Country of input: International Atomic Energy Agency (IAEA); ISSN 0025-5408
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
AEROSOLS
ELECTROCHEMISTRY
MONOCLINIC LATTICES
PHOTOCATALYSIS
PHYSICAL PROPERTIES
POLYCRYSTALS
POROUS MATERIALS
PYROLYSIS
SCANNING ELECTRON MICROSCOPY
SEMICONDUCTOR MATERIALS
THIN FILMS
TIN OXIDES
TUNGSTEN OXIDES
X-RAY DIFFRACTION