ECR plasma-assisted PVD deposition of {alpha}-Fe thin film on melt-spun Nd-Fe-B alloys
- Institute of Plasma Physics, NSC Kharkov Institute of Physics and Technology, Akademicheskaya St. 1, 61108 Kharkov (Ukraine)
- Magnetics Laboratory, University of Dayton, 300 College Park, Dayton, OH 45469 (United States)
The paper deals with plasma-assisted PVD of {alpha}-Fe thin film onto the melt-spun Nd-Fe-B-Co ribbons. The parameters of the plasma created by a planar rectangular ECR plasma source with a multipolar magnetic field and a double-slot antenna were as follows: electron density up to 1x10{sup 10} cm{sup -3}, electron temperature {approx}22 eV, the current density of ion flow to grounded disk-substrate was equal to {approx}0.5 mA/cm{sup 2} at the gas flow of 1 sccm, the microwave power was up to 300W. After degreasing and ultrasonic washing of Nd-Fe-B-Co ribbons, follow by ion etching, the deposition process was realized at a pulsed voltage bias of -1000 V with frequency 100 Hz, total current on the target 240 mA, current density 2.9 mA/cm{sup 2}. The deposition rate of 0.0083 {mu}m/min was achieved. The process continued for 2 hour. It was found that the magnetic melt-spun ribbons were homogeneously coated with the {alpha}-Fe film having a typical thickness of 1 {mu}m.
- OSTI ID:
- 21136955
- Journal Information:
- AIP Conference Proceedings, Vol. 993, Issue 1; Conference: PLASMA 2007: International conference on research and applications of plasmas; 4. German-Polish conference on plasma diagnostics for fusion and applications; 6. French-Polish seminar on thermal plasma in space and laboratory, Greifswald (Germany), 16-19 Oct 2007; Other Information: DOI: 10.1063/1.2909161; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
BORON ALLOYS
CHEMICAL VAPOR DEPOSITION
CURRENT DENSITY
ELECTRIC POTENTIAL
ELECTRON CYCLOTRON-RESONANCE
ELECTRON DENSITY
ELECTRON TEMPERATURE
GAS FLOW
IRON ALLOYS
IRON-ALPHA
MAGNETIC FIELDS
MAGNETIC MATERIALS
NEODYMIUM ALLOYS
PHYSICAL VAPOR DEPOSITION
PLASMA
PLASMA PRODUCTION
RF SYSTEMS
THIN FILMS