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Title: Inverted end-Hall-type low-energy high-current gaseous ion source

Abstract

A novel approach to low-energy, high-current, gaseous ion beam generation was explored and an ion source based on this technique has been developed. The source utilizes a dc high-current (up to 20 A) gaseous discharge with electron injection into the region of ion generation. Compared to the conventional end-Hall ion source, the locations of the discharge anode and cathode are inverted: the cathode is placed inside the source and the anode outside, and correspondingly, the discharge current is in the opposite direction. The discharge operates in a diverging axial magnetic field, similar to the end-Hall source. Electron generation and injection is accomplished by using an additional arc discharge with a ''cold'' (filamentless) hollow cathode. Low plasma contamination is achieved by using a low discharge voltage (avoidance of sputtering), as well as by a special geometric configuration of the emitter discharge electrodes, thereby filtering (removing) the erosion products stemming from the emitter cathode. The device produces a dc ion flow with energy below 20 eV and current up to 2.5 A onto a collector of 500 cm{sup 2} at 25 cm from the source edge, at a pressure {>=}0.02 Pa and gas flow rate {>=}14 SCCM. The ion energy spread ismore » 2 to 3 eV (rms). The source is characterized by high reliability, low maintenance, and long lifetime. The beam contains less than 0.1% of metallic ions. The specific electric energy consumption is 400 eV per ion registered at the collector. The source operates with noble gases, nitrogen, oxygen, and hydrocarbons. Utilizing biasing, it can be used for plasma sputtering, etching, and other ion technologies.« less

Authors:
; ; ; ; ; ;  [1]
  1. High Current Electronics Institute, Russian Academy of Sciences, Tomsk 634055 (Russian Federation)
Publication Date:
OSTI Identifier:
21103962
Resource Type:
Journal Article
Journal Name:
Review of Scientific Instruments
Additional Journal Information:
Journal Volume: 79; Journal Issue: 2; Conference: ICIS 2007: 12. international conference on ion sources, Jeju (Korea, Republic of), 26-31 Aug 2007; Other Information: DOI: 10.1063/1.2801348; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0034-6748
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ANODES; ELECTRIC ARCS; ELECTRIC POTENTIAL; ELECTRON BEAM INJECTION; ELECTRONS; ENERGY CONSUMPTION; HOLLOW CATHODES; HYDROCARBONS; ION BEAMS; ION SOURCES; MAGNETIC FIELDS; NITROGEN; OXYGEN; PLASMA; RARE GASES; SPUTTERING

Citation Formats

Oks, E M, Vizir, A V, Shandrikov, M V, Yushkov, G Yu, Grishin, D M, Anders, A, Baldwin, D A, Lawrence Berkeley National Laboratory, Berkeley, California 94720, and 4Wave, Inc., Sterling, Virginia 20166. Inverted end-Hall-type low-energy high-current gaseous ion source. United States: N. p., 2008. Web. doi:10.1063/1.2801348.
Oks, E M, Vizir, A V, Shandrikov, M V, Yushkov, G Yu, Grishin, D M, Anders, A, Baldwin, D A, Lawrence Berkeley National Laboratory, Berkeley, California 94720, & 4Wave, Inc., Sterling, Virginia 20166. Inverted end-Hall-type low-energy high-current gaseous ion source. United States. doi:10.1063/1.2801348.
Oks, E M, Vizir, A V, Shandrikov, M V, Yushkov, G Yu, Grishin, D M, Anders, A, Baldwin, D A, Lawrence Berkeley National Laboratory, Berkeley, California 94720, and 4Wave, Inc., Sterling, Virginia 20166. Fri . "Inverted end-Hall-type low-energy high-current gaseous ion source". United States. doi:10.1063/1.2801348.
@article{osti_21103962,
title = {Inverted end-Hall-type low-energy high-current gaseous ion source},
author = {Oks, E M and Vizir, A V and Shandrikov, M V and Yushkov, G Yu and Grishin, D M and Anders, A and Baldwin, D A and Lawrence Berkeley National Laboratory, Berkeley, California 94720 and 4Wave, Inc., Sterling, Virginia 20166},
abstractNote = {A novel approach to low-energy, high-current, gaseous ion beam generation was explored and an ion source based on this technique has been developed. The source utilizes a dc high-current (up to 20 A) gaseous discharge with electron injection into the region of ion generation. Compared to the conventional end-Hall ion source, the locations of the discharge anode and cathode are inverted: the cathode is placed inside the source and the anode outside, and correspondingly, the discharge current is in the opposite direction. The discharge operates in a diverging axial magnetic field, similar to the end-Hall source. Electron generation and injection is accomplished by using an additional arc discharge with a ''cold'' (filamentless) hollow cathode. Low plasma contamination is achieved by using a low discharge voltage (avoidance of sputtering), as well as by a special geometric configuration of the emitter discharge electrodes, thereby filtering (removing) the erosion products stemming from the emitter cathode. The device produces a dc ion flow with energy below 20 eV and current up to 2.5 A onto a collector of 500 cm{sup 2} at 25 cm from the source edge, at a pressure {>=}0.02 Pa and gas flow rate {>=}14 SCCM. The ion energy spread is 2 to 3 eV (rms). The source is characterized by high reliability, low maintenance, and long lifetime. The beam contains less than 0.1% of metallic ions. The specific electric energy consumption is 400 eV per ion registered at the collector. The source operates with noble gases, nitrogen, oxygen, and hydrocarbons. Utilizing biasing, it can be used for plasma sputtering, etching, and other ion technologies.},
doi = {10.1063/1.2801348},
journal = {Review of Scientific Instruments},
issn = {0034-6748},
number = 2,
volume = 79,
place = {United States},
year = {2008},
month = {2}
}