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Title: Manifestation of clustering of Ge atoms in the spectra of electron spin resonance of Si{sub 1-x}Ge{sub x} alloys (0 < x < 0.057)

Journal Article · · Semiconductors
; ;  [1];  [2]
  1. Russian Academy of Sciences, Ioffe Physicotechnical Institute (Russian Federation)
  2. Institute for Crystal Growth (Germany)

The electron spin resonance (ESR) at phosphorus dopants in the P-doped Si{sub 1-x}Ge{sub x} alloys (0 < x < 0.057) with the concentration of phosphorus in the range 10{sup 15}-10{sup 16} cm{sup -3} is studied at temperatures from 3 to 30 K. The ESR spectra of the alloys (x > 0) are compared to the ESR spectra of similar silicon samples (x = 0). It is found that, from the smallest Ge content x = 0.008, the ESR spectra contain two additional lines. It is assumed that these lines are due to phosphorus dopants located in clusters with higher Ge content. It is found that an increase in the Ge content in the alloys up to x = 0.024 yields only an increase in the concentration of such clusters. At x {>=} 0.024, the Ge content increases with x both inside and outside the clusters.

OSTI ID:
21088048
Journal Information:
Semiconductors, Vol. 41, Issue 6; Other Information: DOI: 10.1134/S1063782607060103; Copyright (c) 2007 Nauka/Interperiodica; Article Copyright (c) 2007 Pleiades Publishing, Ltd; Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7826
Country of Publication:
United States
Language:
English