Analysis of Substructure Parameters in Different Texture Components and Structure-Formation in Magnetron Sputtered TiN Coatings

Journal Article · Mon Apr 23 00:00:00 EDT 2007 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.2733373· OSTI ID:21057226

Iordanova, I; Mirchev, R ^[1]; Antonov, V ^[2]; Kelly, P J ^[3]; Varblianska, K ^[4]

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1. Department of Solid State Physics and Microelectronics, Faculty of Physics, University of Sofia, 5 blvd. James Bouchier, 1164 Sofia (Bulgaria)
2. Institute for Nuclear Research and Nuclear Energy, 72 Tzarigradsko Chaussee, BG-1784 Sofia (Bulgaria)
3. Surface Engineering Group, Department of Chemistry and Materials, Manchester Metropolitan University, Manchester M15GD (United Kingdom)
4. Semiconductor Physics and Technology Laboratory, Faculty of Physics, University of Sofia, Galichitsa 33A, 1126 Sofia (Bulgaria)

The substructure parameters in the main texture components and structure-formation process during the growth of 500nm and 4000nm reactive CFUBMS TiN deposits as a function of the continuous target current (DC)

• OSTI ID: 21057226
• Journal Information: AIP Conference Proceedings, Vol. 899, Issue 1; Conference: 6. international conference of the Balkan Physical Union, Istanbul (Turkey), 22-26 Aug 2006; Other Information: DOI: 10.1063/1.2733373; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
COATINGS
CRYSTAL GROWTH
CRYSTAL STRUCTURE
ELECTRIC CURRENTS
SPUTTERING
SURFACE COATING
SURFACES
TEXTURE
TITANIUM NITRIDES