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Title: Analysis of Substructure Parameters in Different Texture Components and Structure-Formation in Magnetron Sputtered TiN Coatings

Abstract

The substructure parameters in the main texture components and structure-formation process during the growth of 500nm and 4000nm reactive CFUBMS TiN deposits as a function of the continuous target current (DC)

Authors:
;  [1];  [2];  [3];  [4]
  1. Department of Solid State Physics and Microelectronics, Faculty of Physics, University of Sofia, 5 blvd. James Bouchier, 1164 Sofia (Bulgaria)
  2. Institute for Nuclear Research and Nuclear Energy, 72 Tzarigradsko Chaussee, BG-1784 Sofia (Bulgaria)
  3. Surface Engineering Group, Department of Chemistry and Materials, Manchester Metropolitan University, Manchester M15GD (United Kingdom)
  4. Semiconductor Physics and Technology Laboratory, Faculty of Physics, University of Sofia, Galichitsa 33A, 1126 Sofia (Bulgaria)
Publication Date:
OSTI Identifier:
21057226
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 899; Journal Issue: 1; Conference: 6. international conference of the Balkan Physical Union, Istanbul (Turkey), 22-26 Aug 2006; Other Information: DOI: 10.1063/1.2733373; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; COATINGS; CRYSTAL GROWTH; CRYSTAL STRUCTURE; ELECTRIC CURRENTS; SPUTTERING; SURFACE COATING; SURFACES; TEXTURE; TITANIUM NITRIDES

Citation Formats

Iordanova, I., Mirchev, R., Antonov, V., Kelly, P. J., and Varblianska, K. Analysis of Substructure Parameters in Different Texture Components and Structure-Formation in Magnetron Sputtered TiN Coatings. United States: N. p., 2007. Web. doi:10.1063/1.2733373.
Iordanova, I., Mirchev, R., Antonov, V., Kelly, P. J., & Varblianska, K. Analysis of Substructure Parameters in Different Texture Components and Structure-Formation in Magnetron Sputtered TiN Coatings. United States. doi:10.1063/1.2733373.
Iordanova, I., Mirchev, R., Antonov, V., Kelly, P. J., and Varblianska, K. Mon . "Analysis of Substructure Parameters in Different Texture Components and Structure-Formation in Magnetron Sputtered TiN Coatings". United States. doi:10.1063/1.2733373.
@article{osti_21057226,
title = {Analysis of Substructure Parameters in Different Texture Components and Structure-Formation in Magnetron Sputtered TiN Coatings},
author = {Iordanova, I. and Mirchev, R. and Antonov, V. and Kelly, P. J. and Varblianska, K.},
abstractNote = {The substructure parameters in the main texture components and structure-formation process during the growth of 500nm and 4000nm reactive CFUBMS TiN deposits as a function of the continuous target current (DC)},
doi = {10.1063/1.2733373},
journal = {AIP Conference Proceedings},
number = 1,
volume = 899,
place = {United States},
year = {Mon Apr 23 00:00:00 EDT 2007},
month = {Mon Apr 23 00:00:00 EDT 2007}
}