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Title: Stacked Fresnel Zone Plates for High Energy X-rays

Abstract

A stacking technique was developed in order to increase focusing efficiency of Fresnel zone plates (FZP) at high energies. Two identical Si chips each of which containing 9 FZPs were used for stacking. Alignment of the chips was achieved by on-line observation of the moire pattern. The formation of moire patterns was studied theoretically and experimentally at different experimental conditions. To provide the desired stability Si-chips were bonded together with slow solidification speed epoxy glue. A technique of angular alignment in order to compensate a linear displacement in the process of gluing was proposed. Two sets of stacked FZPs were experimentally tested to focus 15 and 50 keV x rays. The gain in the efficiency by factor 2.5 was demonstrated at 15 keV. The focal spot of 1.8 {mu}m vertically and 14 {mu}m horizontally with 35% efficiency was measured at 50 keV. Forecast for the stacking of nanofocusing FZPs was discussed.

Authors:
; ; ;  [1];  [2]; ;  [3]
  1. ESRF, B.P. 220, 6 rue Jules Horowitz, 38043 Grenoble (France)
  2. Russian Research Centre Kurchatov Institute, 123182 Moscow (Russian Federation)
  3. Institute of Microelectronics Technology RAS, 142432 Chernogolovka, Moscow region (Russian Federation)
Publication Date:
OSTI Identifier:
21052690
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 879; Journal Issue: 1; Conference: 9. international conference on synchrotron radiation instrumentation, Daegu (Korea, Republic of), 28 May - 2 Jun 2006; Other Information: DOI: 10.1063/1.2436230; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; BEAM OPTICS; BEAM PRODUCTION; EFFICIENCY; FOCUSING; GAIN; KEV RANGE; PHOTON BEAMS; SILICON; STABILITY; X RADIATION

Citation Formats

Snigireva, Irina, Snigirev, Anatoly, Vaughan, Gavin, Di Michiel, Marco, Kohn, Viktor, Yunkin, Vyacheslav, and Grigoriev, Maxim. Stacked Fresnel Zone Plates for High Energy X-rays. United States: N. p., 2007. Web. doi:10.1063/1.2436230.
Snigireva, Irina, Snigirev, Anatoly, Vaughan, Gavin, Di Michiel, Marco, Kohn, Viktor, Yunkin, Vyacheslav, & Grigoriev, Maxim. Stacked Fresnel Zone Plates for High Energy X-rays. United States. doi:10.1063/1.2436230.
Snigireva, Irina, Snigirev, Anatoly, Vaughan, Gavin, Di Michiel, Marco, Kohn, Viktor, Yunkin, Vyacheslav, and Grigoriev, Maxim. Fri . "Stacked Fresnel Zone Plates for High Energy X-rays". United States. doi:10.1063/1.2436230.
@article{osti_21052690,
title = {Stacked Fresnel Zone Plates for High Energy X-rays},
author = {Snigireva, Irina and Snigirev, Anatoly and Vaughan, Gavin and Di Michiel, Marco and Kohn, Viktor and Yunkin, Vyacheslav and Grigoriev, Maxim},
abstractNote = {A stacking technique was developed in order to increase focusing efficiency of Fresnel zone plates (FZP) at high energies. Two identical Si chips each of which containing 9 FZPs were used for stacking. Alignment of the chips was achieved by on-line observation of the moire pattern. The formation of moire patterns was studied theoretically and experimentally at different experimental conditions. To provide the desired stability Si-chips were bonded together with slow solidification speed epoxy glue. A technique of angular alignment in order to compensate a linear displacement in the process of gluing was proposed. Two sets of stacked FZPs were experimentally tested to focus 15 and 50 keV x rays. The gain in the efficiency by factor 2.5 was demonstrated at 15 keV. The focal spot of 1.8 {mu}m vertically and 14 {mu}m horizontally with 35% efficiency was measured at 50 keV. Forecast for the stacking of nanofocusing FZPs was discussed.},
doi = {10.1063/1.2436230},
journal = {AIP Conference Proceedings},
number = 1,
volume = 879,
place = {United States},
year = {Fri Jan 19 00:00:00 EST 2007},
month = {Fri Jan 19 00:00:00 EST 2007}
}