skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Compact Double Multilayer Monochromator for SAXS Beamline at PLS

Abstract

The DMM (Double Multilayer Monochromator) is one of the most important components to increase the efficiency of experiments in SAXS beamline. The DMM of SAXS beamline was consisted of x, z stages to decrease the alignment error and 6 movement systems to raise efficiency of adjustment. To determine the type of 1st mirror holder, we simulated heat-transfer and structural analysis with ANSYS code and confirmed the deformation and slope error of the mirror face. With rocking width and weighted standard deviation, we found the optimized results in the mirror systems. To cope with the high precise alignment of pitch and roll direction, CMM and interferometer (HP 5529A) were used. This equipment was installed on Feb, 2006.

Authors:
; ; ; ;  [1]
  1. Pohang Accelerator Laboratory/POSTECH, Hyoja-dong San 31, Pohang 790-390 (Korea, Republic of)
Publication Date:
OSTI Identifier:
21052675
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 879; Journal Issue: 1; Conference: 9. international conference on synchrotron radiation instrumentation, Daegu (Korea, Republic of), 28 May - 2 Jun 2006; Other Information: DOI: 10.1063/1.2436215; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; A CODES; COMPUTERIZED SIMULATION; DEFORMATION; LAYERS; MIRRORS; MONOCHROMATORS; POHANG LIGHT SOURCE; SMALL ANGLE SCATTERING; X-RAY DIFFRACTION

Citation Formats

Kim, S. N., Kim, M. J., Lee, C. S., Kim, J. H., and Koo, C. J.. Compact Double Multilayer Monochromator for SAXS Beamline at PLS. United States: N. p., 2007. Web. doi:10.1063/1.2436215.
Kim, S. N., Kim, M. J., Lee, C. S., Kim, J. H., & Koo, C. J.. Compact Double Multilayer Monochromator for SAXS Beamline at PLS. United States. doi:10.1063/1.2436215.
Kim, S. N., Kim, M. J., Lee, C. S., Kim, J. H., and Koo, C. J.. Fri . "Compact Double Multilayer Monochromator for SAXS Beamline at PLS". United States. doi:10.1063/1.2436215.
@article{osti_21052675,
title = {Compact Double Multilayer Monochromator for SAXS Beamline at PLS},
author = {Kim, S. N. and Kim, M. J. and Lee, C. S. and Kim, J. H. and Koo, C. J.},
abstractNote = {The DMM (Double Multilayer Monochromator) is one of the most important components to increase the efficiency of experiments in SAXS beamline. The DMM of SAXS beamline was consisted of x, z stages to decrease the alignment error and 6 movement systems to raise efficiency of adjustment. To determine the type of 1st mirror holder, we simulated heat-transfer and structural analysis with ANSYS code and confirmed the deformation and slope error of the mirror face. With rocking width and weighted standard deviation, we found the optimized results in the mirror systems. To cope with the high precise alignment of pitch and roll direction, CMM and interferometer (HP 5529A) were used. This equipment was installed on Feb, 2006.},
doi = {10.1063/1.2436215},
journal = {AIP Conference Proceedings},
number = 1,
volume = 879,
place = {United States},
year = {Fri Jan 19 00:00:00 EST 2007},
month = {Fri Jan 19 00:00:00 EST 2007}
}
  • A UHV compatible compact double-crystal monochromator was designed and constructed for BEPC diffraction and the scattering beamline 4B9A. It is a compact device with a 325 /times/250/times/250 mm/sup 3/ vacuum chamber. A T-structure mechanism has been designed for allowing the monochromator to have a Bragg angle range from 5/degree/ to 70/degree/ and keep the exit beam position and direction fixed during wavelength tuning. The first crystal is cooled by a heat-pipe cooling system and a pair of PZT drivers provide a two-dimensional adjustment to optimize the alignment between two crystals. The design and operating principles are described in this paper.
  • A new setup for Transmission Photoelectron Microscopy (T-PEEM) at the 3rd generation Berlin electron storage ring BESSY II is reported and initial results on imaging of dried diatom algae immobilized on a thin silicon membrane are described. The T-PEEM images recorded at a photon energy of 95 eV display a spatial resolution of better than 65 nm. Furthermore spectroscopic imaging is enabled by tuning the illuminating photon energy in the vicinity of x-ray absorption edges.
  • A newly designed monochromator assembly for the State University of New York (SUNY) X3 beamline at the National Synchrotron Light Source (NSLS) consists of two monochromators enclosed in a single vessel, positioned at 7813 mm from the bending magnet source. It allows delivery of monochromatic radiation into two independent end stations. The first unit contains two crystals reflecting in the vertical plane, and operating in a channel-cut'' mode. The second of the crystals can be bent for sagittal focusing of the beam. The second monochromator unit reflects 2 mrad of the radiation fan between the A2 and [ital B] branchesmore » of the beamline at a fixed angle of 2[Theta]=12[degree], and serves the sideways experimental station A1. Four interchangeable triangular crystals, mounted on a rotary holder, provide x rays of four different energies.« less
  • The design and performance of a new double crystal monochromator for x-ray undulator beamline at the PF-AR are described. The monochromator consists of flat silicon (111) crystals, which are cooled by liquid nitrogen in order to reduce the deformation caused by a heat load problem. One of the characteristic points of the monochromator is a usage of a relatively long size of second silicon crystal ({approx}200mm long) along the beam direction. The long crystal makes it possible to eliminate a mechanical translation stage, which is needed to realize the fixed exit position for the monochromatized x-rays. The simplicity of themore » designing contributes to the stability of the monochromator, and there is no problem about vibration and so on. The fixed exit can be achieved by the adjustment of the height of the first crystal. It is possible to keep the deviation of the beam position at the experimental hatch less than 0.01 mm and 0.075mm at vertical and horizontal directions, respectively, under scanning the monochromatized energy from 5 to 20 keV.« less
  • A novel double-multilayer monochromator has been designed for the Advanced Photon Source x-ray undulator beamline at Argonne National Laboratory. The monochromator consists of two ultrahigh-vacuum compatible modular vessels, each with a sine-bar driving structure and a water-cooled multilayer holder. A high precision [ital Y]--[ital Z] stage is used to provide compensating motion for the second multilayer from outside the vacuum chamber so that the monochromator can fix the output monochromatic beam direction and angle during the energy scan in a narrow range. The design details for this monochromator are presented in this paper.