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Title: Nanofocusing at ESRF Using Graded Multilayer Mirrors

Abstract

Dynamically bent graded multilayer mirrors have been developed at ESRF for their large energy bandwidth acceptance, energy tunability and large numerical aperture for limited mirror size. Kirkpatrick Baez systems with spot sizes below 100 nanometers have been installed on two beamlines. A diffraction limited line width of 41 nanometers FWHM was obtained at 24 keV on ID19. This experiment directly confirms that the penetration depth of the X-rays in the multilayer coating does not limit the obtainable focal spot size. The resolution limits of such a nanofocusing device are discussed as well as figure accuracy and vibration level issues.

Authors:
; ; ; ; ; ; ;  [1]
  1. European Synchrotron Radiation Facility (ESRF), BP220 38240, Grenoble (France)
Publication Date:
OSTI Identifier:
21052635
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 879; Journal Issue: 1; Conference: 9. international conference on synchrotron radiation instrumentation, Daegu (Korea, Republic of), 28 May - 2 Jun 2006; Other Information: DOI: 10.1063/1.2436179; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; ACCURACY; APERTURES; BEAM ACCEPTANCE; BEAM PRODUCTION; EUROPEAN SYNCHROTRON RADIATION FACILITY; FOCUSING; KEV RANGE; LAYERS; LINE WIDTHS; MIRRORS; PENETRATION DEPTH; PHOTON BEAMS; RESOLUTION; X RADIATION; X-RAY DIFFRACTION

Citation Formats

Hignette, O., Cloetens, P., Morawe, C., Borel, C., Ludwig, W., Bernard, P., Rommeveaux, A., and Bohic, S. Nanofocusing at ESRF Using Graded Multilayer Mirrors. United States: N. p., 2007. Web. doi:10.1063/1.2436179.
Hignette, O., Cloetens, P., Morawe, C., Borel, C., Ludwig, W., Bernard, P., Rommeveaux, A., & Bohic, S. Nanofocusing at ESRF Using Graded Multilayer Mirrors. United States. doi:10.1063/1.2436179.
Hignette, O., Cloetens, P., Morawe, C., Borel, C., Ludwig, W., Bernard, P., Rommeveaux, A., and Bohic, S. Fri . "Nanofocusing at ESRF Using Graded Multilayer Mirrors". United States. doi:10.1063/1.2436179.
@article{osti_21052635,
title = {Nanofocusing at ESRF Using Graded Multilayer Mirrors},
author = {Hignette, O. and Cloetens, P. and Morawe, C. and Borel, C. and Ludwig, W. and Bernard, P. and Rommeveaux, A. and Bohic, S.},
abstractNote = {Dynamically bent graded multilayer mirrors have been developed at ESRF for their large energy bandwidth acceptance, energy tunability and large numerical aperture for limited mirror size. Kirkpatrick Baez systems with spot sizes below 100 nanometers have been installed on two beamlines. A diffraction limited line width of 41 nanometers FWHM was obtained at 24 keV on ID19. This experiment directly confirms that the penetration depth of the X-rays in the multilayer coating does not limit the obtainable focal spot size. The resolution limits of such a nanofocusing device are discussed as well as figure accuracy and vibration level issues.},
doi = {10.1063/1.2436179},
journal = {AIP Conference Proceedings},
number = 1,
volume = 879,
place = {United States},
year = {Fri Jan 19 00:00:00 EST 2007},
month = {Fri Jan 19 00:00:00 EST 2007}
}
  • In the LBNL x-ray fluorescence microprobe, a synchrotron source of x-rays is demagnified several hundred times using a pair of mirrors in the Kirkpatrick-Baez configuration. These are coated with multilayers to increase reflectivity and limit the pass band of the x-rays striking the sample. With spherical mirrors, the spot size obtained is limited by spherical aberration. This can be corrected by using an initially flat mirror elastically bent by a combination of end couples into an ellipse. By grading the multilayer coatings in d-spacing, the throughput of the focusing system is increased and the pass band narrowed. A pair ofmore » such mirrors, installed in the microprobe on a bending magnet at the Advanced Light Source (ALS), achieved focal spots of dimensions 1{mu}m{times}1 {mu}m at energies of 8.5 keV and 12 keV, with an energy pass band of 10{percent}. {copyright} {ital 1996 American Institute of Physics.}« less
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  • We report the fabrication and the characterization of a wedged multilayer Laue lens for x-ray nanofocusing. The lens was fabricated using sputtering deposition technique, and a specially designed mask was employed to introduce a thickness gradient in the lateral direction of the multilayer. X-ray characterization showed an efficiency of 27% and a focus size of 24 nm at 14.6 keV, in a good agreement with theoretical calculations. These results indicate that the desired wedging was achieved in the fabricated wedged MLL. We anticipate that continuous development on wedged MLL will advance x-ray nanofocusing optics to new frontiers, and enriches capabilitiesmore » and opportunities for hard X-ray microscopy.« less
  • We report on the fabrication and the characterization of a wedged multilayer Laue lens for x-ray nanofocusing. The lens was fabricated using a sputtering deposition technique, in which a specially designed mask was employed to introduce a thickness gradient in the lateral direction of the multilayer. X-ray characterization shows an efficiency of 27% and a focus size of 26 nm at 14.6 keV, in a good agreement with theoretical calculations. These results indicate that the desired wedging is achieved in the fabricated structure. We anticipate that continuous development on wedged MLLs will advance x-ray nanofocusing optics to new frontiers andmore » enrich capabilities and opportunities for hard X-ray microscopy.« less