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Title: Reflectance and Resolution of Multilayer Monochromators for Photon Energies from 400 - 6000 eV

Abstract

This paper deals with multilayer monochromators for synchrotron beamlines that are produced by magnetron and ion beam sputter deposition (MSD and IBSD). Different material combinations (W/B4C, W/Si, Mo/B4C, Mo/Si) with period thicknesses between 1 nm and 10 nm have been fabricated and measured at the synchrotron BESSY II (optics and KMC1 beamlines). The main challenge for the deposition of nanometer multilayers is to find growth conditions where the interfaces between adjacent layers are abrupt (no interdiffusion {sigma}d) and smooth (no roughness {sigma}r). The interface width {sigma} ({sigma}{sup 2} = {sigma}{sub d}{sup 2} + {sigma}{sub r}{sup 2}) becomes increasingly important for smaller period thicknesses. One decisive point for the interface formation is the kinetic energy distribution of the particles arriving on the substrate surface. In MSD, the sputter gas pressure is the main parameter for influencing the kinetic energy of the particles. In IBSD, an assist ion beam source can be used to bombard the growing film with inert gas atoms of a specific energy. Using this option, the best compromise between low interdiffusion and low roughness can be found for every material combination. Investigations of the reflection of W/B4C multilayers with period thicknesses of 1.2 nm and number of periodsmore » N = 50, 300 and 600 show that no roughness increase occurs with increasing N. Typical values for the interface widths are {sigma} = 0.27...0.28 nm.« less

Authors:
; ; ;  [1]; ;  [2]
  1. IWS Dresden, Fraunhofer-Institut fuer Werkstoff- und Strahltechnik, Winterbergstr. 28, 01277 Dresden (Germany)
  2. Berliner Elektronenspeicherring-Gesellschaft fuer Synchrotronstrahlung m.b.H (BESSY), Albert-Einstein-Str. 15, 14489 Berlin (Germany)
Publication Date:
OSTI Identifier:
21052561
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 879; Journal Issue: 1; Conference: 9. international conference on synchrotron radiation instrumentation, Daegu (Korea, Republic of), 28 May - 2 Jun 2006; Other Information: DOI: 10.1063/1.2436106; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; BEAM OPTICS; BESSY STORAGE RING; DISTRIBUTION; INTERFACES; ION BEAMS; LAYERS; MONOCHROMATORS; PHOTON BEAMS; PHOTONS; REFLECTION; REFLECTIVITY; RESOLUTION; ROUGHNESS; SPUTTERING; SUBSTRATES; SURFACE COATING; SURFACES; SYNCHROTRON RADIATION; THICKNESS

Citation Formats

Braun, Stefan, Gawlitza, Peter, Menzel, Maik, Leson, Andreas, Mertin, Marcel, and Schaefers, Franz. Reflectance and Resolution of Multilayer Monochromators for Photon Energies from 400 - 6000 eV. United States: N. p., 2007. Web. doi:10.1063/1.2436106.
Braun, Stefan, Gawlitza, Peter, Menzel, Maik, Leson, Andreas, Mertin, Marcel, & Schaefers, Franz. Reflectance and Resolution of Multilayer Monochromators for Photon Energies from 400 - 6000 eV. United States. doi:10.1063/1.2436106.
Braun, Stefan, Gawlitza, Peter, Menzel, Maik, Leson, Andreas, Mertin, Marcel, and Schaefers, Franz. Fri . "Reflectance and Resolution of Multilayer Monochromators for Photon Energies from 400 - 6000 eV". United States. doi:10.1063/1.2436106.
@article{osti_21052561,
title = {Reflectance and Resolution of Multilayer Monochromators for Photon Energies from 400 - 6000 eV},
author = {Braun, Stefan and Gawlitza, Peter and Menzel, Maik and Leson, Andreas and Mertin, Marcel and Schaefers, Franz},
abstractNote = {This paper deals with multilayer monochromators for synchrotron beamlines that are produced by magnetron and ion beam sputter deposition (MSD and IBSD). Different material combinations (W/B4C, W/Si, Mo/B4C, Mo/Si) with period thicknesses between 1 nm and 10 nm have been fabricated and measured at the synchrotron BESSY II (optics and KMC1 beamlines). The main challenge for the deposition of nanometer multilayers is to find growth conditions where the interfaces between adjacent layers are abrupt (no interdiffusion {sigma}d) and smooth (no roughness {sigma}r). The interface width {sigma} ({sigma}{sup 2} = {sigma}{sub d}{sup 2} + {sigma}{sub r}{sup 2}) becomes increasingly important for smaller period thicknesses. One decisive point for the interface formation is the kinetic energy distribution of the particles arriving on the substrate surface. In MSD, the sputter gas pressure is the main parameter for influencing the kinetic energy of the particles. In IBSD, an assist ion beam source can be used to bombard the growing film with inert gas atoms of a specific energy. Using this option, the best compromise between low interdiffusion and low roughness can be found for every material combination. Investigations of the reflection of W/B4C multilayers with period thicknesses of 1.2 nm and number of periods N = 50, 300 and 600 show that no roughness increase occurs with increasing N. Typical values for the interface widths are {sigma} = 0.27...0.28 nm.},
doi = {10.1063/1.2436106},
journal = {AIP Conference Proceedings},
number = 1,
volume = 879,
place = {United States},
year = {Fri Jan 19 00:00:00 EST 2007},
month = {Fri Jan 19 00:00:00 EST 2007}
}