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Title: Study of LOR5B resist for the Fabrication of Hard X-ray Zone Plates by E-beam Lithography and ICP

Abstract

We used an approach combining Inductively Coupled Plasma (ICP) etching process and high resolution electron beam lithography and successfully fabricate high aspect ratio zone plate for hard-x-ray applications. The electron beam lithography defines the pattern with outmost zone dimension smaller than 100nm while the consequently ICP produced high aspect ratio structures. Both chacteristics, high resolution patterning and high aspect ratio are required to produce zone plate devices for multi-keV x-rays. We demonstrated that a zone plate with a 60nm outmost zone and a thickness of 500nm is achievable by this approach.

Authors:
 [1];  [2]; ; ; ;  [1];  [1];  [2];  [3];
  1. Institute of Physics, Academia Sinica, Taipei 115, Taiwan (China)
  2. (China)
  3. Ecole Polytechnique Federale, CH-1015 Lausanne (Switzerland)
Publication Date:
OSTI Identifier:
21049309
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 879; Journal Issue: 1; Conference: 9. international conference on synchrotron radiation instrumentation, Daegu (Korea, Republic of), 28 May - 2 Jun 2006; Other Information: DOI: 10.1063/1.2436353; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ASPECT RATIO; ELECTRON BEAMS; ETCHING; FABRICATION; HARD X RADIATION; KEV RANGE; MASKING; OPTICS; PLASMA; PLATES; RESOLUTION

Citation Formats

Chen, Y. T., Department of Materials Engineering, Tatung University, Taipei 104, Taiwan, Lin, I. K., Lo, T. N., Liu, C. J., Je, J. H., Su, C. I., Institute of Optoelectronic Science at National Taiwan Ocean University, Keelung 202, Taiwan, Margaritondo, G., and Hwu, Y. Study of LOR5B resist for the Fabrication of Hard X-ray Zone Plates by E-beam Lithography and ICP. United States: N. p., 2007. Web. doi:10.1063/1.2436353.
Chen, Y. T., Department of Materials Engineering, Tatung University, Taipei 104, Taiwan, Lin, I. K., Lo, T. N., Liu, C. J., Je, J. H., Su, C. I., Institute of Optoelectronic Science at National Taiwan Ocean University, Keelung 202, Taiwan, Margaritondo, G., & Hwu, Y. Study of LOR5B resist for the Fabrication of Hard X-ray Zone Plates by E-beam Lithography and ICP. United States. doi:10.1063/1.2436353.
Chen, Y. T., Department of Materials Engineering, Tatung University, Taipei 104, Taiwan, Lin, I. K., Lo, T. N., Liu, C. J., Je, J. H., Su, C. I., Institute of Optoelectronic Science at National Taiwan Ocean University, Keelung 202, Taiwan, Margaritondo, G., and Hwu, Y. Fri . "Study of LOR5B resist for the Fabrication of Hard X-ray Zone Plates by E-beam Lithography and ICP". United States. doi:10.1063/1.2436353.
@article{osti_21049309,
title = {Study of LOR5B resist for the Fabrication of Hard X-ray Zone Plates by E-beam Lithography and ICP},
author = {Chen, Y. T. and Department of Materials Engineering, Tatung University, Taipei 104, Taiwan and Lin, I. K. and Lo, T. N. and Liu, C. J. and Je, J. H. and Su, C. I. and Institute of Optoelectronic Science at National Taiwan Ocean University, Keelung 202, Taiwan and Margaritondo, G. and Hwu, Y},
abstractNote = {We used an approach combining Inductively Coupled Plasma (ICP) etching process and high resolution electron beam lithography and successfully fabricate high aspect ratio zone plate for hard-x-ray applications. The electron beam lithography defines the pattern with outmost zone dimension smaller than 100nm while the consequently ICP produced high aspect ratio structures. Both chacteristics, high resolution patterning and high aspect ratio are required to produce zone plate devices for multi-keV x-rays. We demonstrated that a zone plate with a 60nm outmost zone and a thickness of 500nm is achievable by this approach.},
doi = {10.1063/1.2436353},
journal = {AIP Conference Proceedings},
number = 1,
volume = 879,
place = {United States},
year = {Fri Jan 19 00:00:00 EST 2007},
month = {Fri Jan 19 00:00:00 EST 2007}
}