X-ray-based Micro/Nanomanufacturing at SSLS - Technology and Applications
- Singapore Synchrotron Light Source (SSLS), National University of Singapore (NUS), 5 Research Link, Singapore 117603 (Singapore)
Deep and high-aspect-ratio micro/nanostructures can be accurately patterned in a variety of resists by proximity lithography using high energy, intense, parallel beams of X-rays from synchrotron radiation sources. Using so called LIGA technology, high-aspect-ratio micro/nanostructures can be produced with vertical dimensions ranging from micrometers to millimeters and horizontal dimensions as small as microns. SSLS has set up its LiMiNT facility (Lithography for Micro/Nanotechnology) and is running it partly as a foundry, partly as a research lab. Under the foundry aspect, work is done for customers in various fields of applications. SSLS' own research is focusing on the development of devices and artificial composite materials such as electromagnetic metamaterials. In this paper, the technology capabilities of the LiMiNT facility and application examples are presented.
- OSTI ID:
- 21049308
- Journal Information:
- AIP Conference Proceedings, Vol. 879, Issue 1; Conference: 9. international conference on synchrotron radiation instrumentation, Daegu (Korea, Republic of), 28 May - 2 Jun 2006; Other Information: DOI: 10.1063/1.2436352; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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