skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: X-ray-based Micro/Nanomanufacturing at SSLS - Technology and Applications

Abstract

Deep and high-aspect-ratio micro/nanostructures can be accurately patterned in a variety of resists by proximity lithography using high energy, intense, parallel beams of X-rays from synchrotron radiation sources. Using so called LIGA technology, high-aspect-ratio micro/nanostructures can be produced with vertical dimensions ranging from micrometers to millimeters and horizontal dimensions as small as microns. SSLS has set up its LiMiNT facility (Lithography for Micro/Nanotechnology) and is running it partly as a foundry, partly as a research lab. Under the foundry aspect, work is done for customers in various fields of applications. SSLS' own research is focusing on the development of devices and artificial composite materials such as electromagnetic metamaterials. In this paper, the technology capabilities of the LiMiNT facility and application examples are presented.

Authors:
; ; ; ; ; ; ;  [1]
  1. Singapore Synchrotron Light Source (SSLS), National University of Singapore (NUS), 5 Research Link, Singapore 117603 (Singapore)
Publication Date:
OSTI Identifier:
21049308
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 879; Journal Issue: 1; Conference: 9. international conference on synchrotron radiation instrumentation, Daegu (Korea, Republic of), 28 May - 2 Jun 2006; Other Information: DOI: 10.1063/1.2436352; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; ASPECT RATIO; COMPOSITE MATERIALS; FOCUSING; FOUNDRIES; MASKING; NANOSTRUCTURES; SYNCHROTRON RADIATION; SYNCHROTRON RADIATION SOURCES; X RADIATION

Citation Formats

Jian, L. K., Casse, B. D. F., Heussler, S. P., Kong, J. R., Moser, H. O., Ren, Y. P., Saw, B. T., and Mahmood, Shahrain bin. X-ray-based Micro/Nanomanufacturing at SSLS - Technology and Applications. United States: N. p., 2007. Web. doi:10.1063/1.2436352.
Jian, L. K., Casse, B. D. F., Heussler, S. P., Kong, J. R., Moser, H. O., Ren, Y. P., Saw, B. T., & Mahmood, Shahrain bin. X-ray-based Micro/Nanomanufacturing at SSLS - Technology and Applications. United States. doi:10.1063/1.2436352.
Jian, L. K., Casse, B. D. F., Heussler, S. P., Kong, J. R., Moser, H. O., Ren, Y. P., Saw, B. T., and Mahmood, Shahrain bin. Fri . "X-ray-based Micro/Nanomanufacturing at SSLS - Technology and Applications". United States. doi:10.1063/1.2436352.
@article{osti_21049308,
title = {X-ray-based Micro/Nanomanufacturing at SSLS - Technology and Applications},
author = {Jian, L. K. and Casse, B. D. F. and Heussler, S. P. and Kong, J. R. and Moser, H. O. and Ren, Y. P. and Saw, B. T. and Mahmood, Shahrain bin},
abstractNote = {Deep and high-aspect-ratio micro/nanostructures can be accurately patterned in a variety of resists by proximity lithography using high energy, intense, parallel beams of X-rays from synchrotron radiation sources. Using so called LIGA technology, high-aspect-ratio micro/nanostructures can be produced with vertical dimensions ranging from micrometers to millimeters and horizontal dimensions as small as microns. SSLS has set up its LiMiNT facility (Lithography for Micro/Nanotechnology) and is running it partly as a foundry, partly as a research lab. Under the foundry aspect, work is done for customers in various fields of applications. SSLS' own research is focusing on the development of devices and artificial composite materials such as electromagnetic metamaterials. In this paper, the technology capabilities of the LiMiNT facility and application examples are presented.},
doi = {10.1063/1.2436352},
journal = {AIP Conference Proceedings},
number = 1,
volume = 879,
place = {United States},
year = {Fri Jan 19 00:00:00 EST 2007},
month = {Fri Jan 19 00:00:00 EST 2007}
}