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Title: Soft X-ray Lithography Beamline at the Siam Photon Laboratory

Abstract

Construction of a soft x-ray lithography beamline utilizing synchrotron radiation generated by one of the bending magnets at the Siam Photon Laboratory is finished and the beamline is currently in a commissioning period. The beamline was modified from the existing monitoring beamline and is intended for soft x-ray lithographic processing and radiation biological research. The lithography exposure station with a compact one-dimensional scanning mechanism was constructed and assembled in-house. The front-end of the beamline has been modified to allow larger exposure area. The exposure station for studying radiation effects on biological samples will be set up in tandem with the lithography station, with a Mylar window for isolation. Several improvements to both the beamline and the exposure stations, such as improved scanning speed and the ability to adjust the exposure spectrum by means of low-Z filters, are planned and will be implemented in the near future.

Authors:
; ;  [1]
  1. National Synchrotron Research Center, 111 University Ave., Muang District, Nakhon Ratchasima 30000 (Thailand)
Publication Date:
OSTI Identifier:
21049306
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 879; Journal Issue: 1; Conference: 9. international conference on synchrotron radiation instrumentation, Daegu (Korea, Republic of), 28 May - 2 Jun 2006; Other Information: DOI: 10.1063/1.2436347; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; BEAM BENDING MAGNETS; BEAM MONITORING; BEAM MONITORS; COMMISSIONING; FILTERS; MASKING; MYLAR; PHOTONS; RADIATION EFFECTS; SOFT X RADIATION; SYNCHROTRON RADIATION; THAILAND

Citation Formats

Klysubun, P., Chomnawang, N., and Songsiriritthigul, P. Soft X-ray Lithography Beamline at the Siam Photon Laboratory. United States: N. p., 2007. Web. doi:10.1063/1.2436347.
Klysubun, P., Chomnawang, N., & Songsiriritthigul, P. Soft X-ray Lithography Beamline at the Siam Photon Laboratory. United States. doi:10.1063/1.2436347.
Klysubun, P., Chomnawang, N., and Songsiriritthigul, P. Fri . "Soft X-ray Lithography Beamline at the Siam Photon Laboratory". United States. doi:10.1063/1.2436347.
@article{osti_21049306,
title = {Soft X-ray Lithography Beamline at the Siam Photon Laboratory},
author = {Klysubun, P. and Chomnawang, N. and Songsiriritthigul, P.},
abstractNote = {Construction of a soft x-ray lithography beamline utilizing synchrotron radiation generated by one of the bending magnets at the Siam Photon Laboratory is finished and the beamline is currently in a commissioning period. The beamline was modified from the existing monitoring beamline and is intended for soft x-ray lithographic processing and radiation biological research. The lithography exposure station with a compact one-dimensional scanning mechanism was constructed and assembled in-house. The front-end of the beamline has been modified to allow larger exposure area. The exposure station for studying radiation effects on biological samples will be set up in tandem with the lithography station, with a Mylar window for isolation. Several improvements to both the beamline and the exposure stations, such as improved scanning speed and the ability to adjust the exposure spectrum by means of low-Z filters, are planned and will be implemented in the near future.},
doi = {10.1063/1.2436347},
journal = {AIP Conference Proceedings},
number = 1,
volume = 879,
place = {United States},
year = {Fri Jan 19 00:00:00 EST 2007},
month = {Fri Jan 19 00:00:00 EST 2007}
}
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  • In the last years we witnessed an increasing trend in miniaturization of electronic, mechanical, optical and magnetic components. Currently, the ultimate Critical Dimension (CD) of such components is rapidly approaching the 10 nm length scale, with a growing interest in integrating different components in complex systems. Advanced fabrication techniques are thus required to rapidly pattern substrates on the 10-100 nm length scale, and soft X-Ray Lithography (XRL) has proven its patterning ability down to 40 nm, with the possibility to be further extended. The construction and commissioning of the Australia Synchrotron, that will be operational in 2007, gives the possibilitymore » to build such a facility on a powerful third-generation synchrotron source. This work is a comparative study of three possible beamlines devoted to XRL, one of which could be installed at the Australian Synchrotron. The optical layout and the thermal load have been studied, under the constraints given by the storage ring, the ultimate patterning ability, the current mask technology and two possible exposure stations, aiming at replicating structures in the sub-100 nm level. Ray tracing simulations have been performed in order to assess the optical layout and the performances of the beamlines, which in principle can cover a wide lithographic window between 1 and 8 keV incoming photon energy.« less
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