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Title: Progress on PEEM3 -- An Aberration Corrected X-Ray Photoemission Electron Microscope at the ALS

Abstract

A new ultrahigh-resolution photoemission electron microscope called PEEM3 is being developed and built at the Advanced Light Source (ALS). An electron mirror combined with a much-simplified magnetic dipole separator is to be used to provide simultaneous correction of spherical and chromatic aberrations. It is installed on an elliptically polarized undulator (EPU) beamline, and will be operated with very high spatial resolution and high flux to study the composition, structure, electric and magnetic properties of complex materials. The instrument has been designed and is described. The instrumental hardware is being deployed in 2 phases. The first phase is the deployment of a standard PEEM type microscope consisting of the standard linear array of electrostatic electron lenses. The second phase will be the installation of the aberration corrected upgrade to improve resolution and throughput. This paper describes progress as the instrument enters the commissioning part of the first phase.

Authors:
; ; ; ; ; ; ; ; ; ; ; ; ;  [1];  [2];  [3];  [4];  [5];  [6]
  1. Advanced Light Source, Lawrence Berkeley National Lab. Berkeley, CA 94720 (United States)
  2. High Energy Accelerator Research Organization, 1-1 Oho, Tsukuba, Ibaraki, 305-0810 (Japan)
  3. IBM, Almaden Research Center, 650 Harry Road, San Jose, CA 95120 (United States)
  4. Stanford Synchrotron Radiation Laboratory, PO Box 20450, Stanford, CA 94309 (United States)
  5. NSRRC, 101 Hsin-Ann Road, Hsinchu 30077, Taiwan (China)
  6. Department of Physics, Duke University, Durham, NC 27708 (United States)
Publication Date:
OSTI Identifier:
21049274
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 879; Journal Issue: 1; Conference: 9. international conference on synchrotron radiation instrumentation, Daegu (Korea, Republic of), 28 May - 2 Jun 2006; Other Information: DOI: 10.1063/1.2436312; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; ADVANCED LIGHT SOURCE; CHROMATIC ABERRATIONS; COMMISSIONING; CORRECTIONS; ELECTRON MICROSCOPY; ELECTRONS; EMISSION SPECTROSCOPY; LENSES; MAGNETIC DIPOLES; MAGNETIC PROPERTIES; MIRRORS; PHOTOELECTRON SPECTROSCOPY; PHOTOEMISSION; SPATIAL RESOLUTION; SPHERICAL CONFIGURATION; WIGGLER MAGNETS; X RADIATION

Citation Formats

MacDowell, A. A., Feng, J., DeMello, A., Doran, A., Duarte, R., Kelez, N., Marcus, M. A., Miller, T., Padmore, H. A., Robin, D., Scholl, A., Schlueter, R., Schmid, P., Wan, W., Forest, E., Raoux, S., Stoehr, J., Wei, D. H., and Wu, Y. Progress on PEEM3 -- An Aberration Corrected X-Ray Photoemission Electron Microscope at the ALS. United States: N. p., 2007. Web. doi:10.1063/1.2436312.
MacDowell, A. A., Feng, J., DeMello, A., Doran, A., Duarte, R., Kelez, N., Marcus, M. A., Miller, T., Padmore, H. A., Robin, D., Scholl, A., Schlueter, R., Schmid, P., Wan, W., Forest, E., Raoux, S., Stoehr, J., Wei, D. H., & Wu, Y. Progress on PEEM3 -- An Aberration Corrected X-Ray Photoemission Electron Microscope at the ALS. United States. doi:10.1063/1.2436312.
MacDowell, A. A., Feng, J., DeMello, A., Doran, A., Duarte, R., Kelez, N., Marcus, M. A., Miller, T., Padmore, H. A., Robin, D., Scholl, A., Schlueter, R., Schmid, P., Wan, W., Forest, E., Raoux, S., Stoehr, J., Wei, D. H., and Wu, Y. Fri . "Progress on PEEM3 -- An Aberration Corrected X-Ray Photoemission Electron Microscope at the ALS". United States. doi:10.1063/1.2436312.
@article{osti_21049274,
title = {Progress on PEEM3 -- An Aberration Corrected X-Ray Photoemission Electron Microscope at the ALS},
author = {MacDowell, A. A. and Feng, J. and DeMello, A. and Doran, A. and Duarte, R. and Kelez, N. and Marcus, M. A. and Miller, T. and Padmore, H. A. and Robin, D. and Scholl, A. and Schlueter, R. and Schmid, P. and Wan, W. and Forest, E. and Raoux, S. and Stoehr, J. and Wei, D. H. and Wu, Y.},
abstractNote = {A new ultrahigh-resolution photoemission electron microscope called PEEM3 is being developed and built at the Advanced Light Source (ALS). An electron mirror combined with a much-simplified magnetic dipole separator is to be used to provide simultaneous correction of spherical and chromatic aberrations. It is installed on an elliptically polarized undulator (EPU) beamline, and will be operated with very high spatial resolution and high flux to study the composition, structure, electric and magnetic properties of complex materials. The instrument has been designed and is described. The instrumental hardware is being deployed in 2 phases. The first phase is the deployment of a standard PEEM type microscope consisting of the standard linear array of electrostatic electron lenses. The second phase will be the installation of the aberration corrected upgrade to improve resolution and throughput. This paper describes progress as the instrument enters the commissioning part of the first phase.},
doi = {10.1063/1.2436312},
journal = {AIP Conference Proceedings},
number = 1,
volume = 879,
place = {United States},
year = {Fri Jan 19 00:00:00 EST 2007},
month = {Fri Jan 19 00:00:00 EST 2007}
}
  • A new ultrahigh-resolution photoemission electron microscope called PEEM3 is being developed and built at the Advanced Light Source (ALS). An electron mirror combined with a much-simplified magnetic dipole separator is to be used to provide simultaneous correction of spherical and chromatic aberrations. It is installed on an elliptically polarized undulator (EPU) beamline, and will be operated with very high spatial resolution and high flux to study the composition, structure, electric and magnetic properties of complex materials. The instrument has been designed and is described. The instrumental hardware is being deployed in 2 phases. The first phase is the deployment ofmore » a standard PEEM type microscope consisting of the standard linear array of electrostatic electron lenses. The second phase will be the installation of the aberration corrected upgrade to improve resolution and throughput. This paper describes progress as the instrument enters the commissioning part of the first phase.« less
  • The aberration of a multipole Wien filter for energy-filtered x-ray photoemission electron microscopy was analyzed and the optimized Fourier components of the electric and magnetic fields for the third-order aperture aberration corrections were obtained. It was found that the third-order aperture aberration correction requires 12 electrodes and magnetic poles.
  • No abstract prepared.
  • Design of a new aberration corrected Photoemission electron microscope PEEM3 at the Advanced Light Source is outlined. PEEM3 will be installed on an elliptically polarized undulator beamline and will be used for the study of complex materials at high spatial and spectral resolution. The critical components of PEEM3 are the electron mirror aberration corrector and aberration-free magnetic beam separator. The models to calculate the optical properties of the electron mirror are discussed. The goal of the PEEM3 project is to achieve the highest possible transmission of the system at resolutions comparable to our present PEEM2 system (50 nm) and tomore » enable significantly higher resolution, albeit at the sacrifice of intensity. We have left open the possibility to add an energy filter at a later date, if it becomes necessary driven by scientific need to improve the resolution further.« less
  • No abstract prepared.