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Title: Ray-Tracing Analysis of Fresnel-Zone-Plate Optical System as an Electron Beam Profile Monitor

Abstract

The analysis of the image distortion made by Fresnel-zone-plate optical system was studied with ray trace simulation and analytical treatment. The tolerable tilt angle depends on the tolerable image size. The distortion appears not only in image size but in image inclination. The simulation and the analysis performed for the optical parameters of the electron beam profile monitor may be useful for the advancement of the X-ray microscope performance.

Authors:
; ;  [1]; ;  [2]
  1. Synchrotron Radiation Laboratory, Institute for Solid State Physics, University of Tokyo, Kashiwanoha, 5-1-5, Kashiwa, Chiba, 277-8581 (Japan)
  2. High Energy Accelerator Research Organization (KEK), Oho 1-1, Tsukuba, Ibaraki (Japan)
Publication Date:
OSTI Identifier:
21049215
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 879; Journal Issue: 1; Conference: 9. international conference on synchrotron radiation instrumentation, Daegu (Korea, Republic of), 28 May - 2 Jun 2006; Other Information: DOI: 10.1063/1.2436259; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; BEAM OPTICS; COMPUTERIZED SIMULATION; ELECTRON BEAMS; IMAGE PROCESSING; IMAGES; OPTICAL SYSTEMS; PERFORMANCE; PLATES; X RADIATION

Citation Formats

Fujisawa, Masami, Sakai, Hiroshi, Nakamura, Norio, Hayano, Hitoshi, and Muto, Toshiya. Ray-Tracing Analysis of Fresnel-Zone-Plate Optical System as an Electron Beam Profile Monitor. United States: N. p., 2007. Web. doi:10.1063/1.2436259.
Fujisawa, Masami, Sakai, Hiroshi, Nakamura, Norio, Hayano, Hitoshi, & Muto, Toshiya. Ray-Tracing Analysis of Fresnel-Zone-Plate Optical System as an Electron Beam Profile Monitor. United States. doi:10.1063/1.2436259.
Fujisawa, Masami, Sakai, Hiroshi, Nakamura, Norio, Hayano, Hitoshi, and Muto, Toshiya. Fri . "Ray-Tracing Analysis of Fresnel-Zone-Plate Optical System as an Electron Beam Profile Monitor". United States. doi:10.1063/1.2436259.
@article{osti_21049215,
title = {Ray-Tracing Analysis of Fresnel-Zone-Plate Optical System as an Electron Beam Profile Monitor},
author = {Fujisawa, Masami and Sakai, Hiroshi and Nakamura, Norio and Hayano, Hitoshi and Muto, Toshiya},
abstractNote = {The analysis of the image distortion made by Fresnel-zone-plate optical system was studied with ray trace simulation and analytical treatment. The tolerable tilt angle depends on the tolerable image size. The distortion appears not only in image size but in image inclination. The simulation and the analysis performed for the optical parameters of the electron beam profile monitor may be useful for the advancement of the X-ray microscope performance.},
doi = {10.1063/1.2436259},
journal = {AIP Conference Proceedings},
number = 1,
volume = 879,
place = {United States},
year = {Fri Jan 19 00:00:00 EST 2007},
month = {Fri Jan 19 00:00:00 EST 2007}
}
  • We have developed a beam profile monitor using two Fresnel zone plates (FZPs) at the KEK-ATF (Accelerator Test Facility) damping ring to measure small electron-beam sizes for low-emittance synchrotron radiation sources. The monitor has a structure of an X-ray microscope, where two FZPs constitute an X-ray imaging optics. In the monitor system, the synchrotron radiation from the electron beam at the bending magnet is monochromatized to 3.235-keV X-rays by a crystal monochromator and the transverse electron-beam image is twenty-times magnified by the two FZPs and detected on an X-ray CCD camera. This monitor has the following advantages: (1) high spatialmore » resolution, (2) non-destructive measurement, (3) real-time monitoring, and (4) direct electron-beam imaging. With the beam profile monitor, we have succeeded in obtaining a clear electron-beam image and measuring the extremely small beam size less than 10 {mu}m. The measured magnification of the imaging optics was in good agreement with the design value.« less
  • To extend soft x-ray microscopy to a resolution of order 10 nm or better, we developed a new nanofabrication process for Fresnel zone plate lenses. The new process, based on the double patterning technique, has enabled us to fabricate high quality gold zone plates with 12 nm outer zones. Testing of the zone plate with the full-field transmission x-ray microscope, XM-1, in Berkeley, showed that the lens clearly resolved 12 nm lines and spaces. This result represents a significant step towards 10 nm resolution and beyond.
  • An optics for hard x-ray holographic microscopy has been developed and preliminary experiments have been done at SPring-8 undulator beamline 20XU. The optical system consists of an x-ray objective lens (Fresnel zone plate) and a wave front-division-type interferometer with prism optics. The illuminating x-ray beam is coherent with parallel radiation, and the spatially coherent area is much larger than the aperture of the objective lens. The refractive prism is placed behind the back focal plane of the objective lens in order to configure the wavefront-dividing interferometer. Half of the illuminating radiation is used for illuminating an object, and the othermore » half is used for forming a reference wave. The magnified image of the object is generated at an image plane, and the reference wave is superimposed on the magnified image of the object. The recorded interferogram includes both amplitude and phase information of the object. The spatial resolution is determined by the numerical aperture of the objective lens. Therefore, in principle, this method enables holographic imaging at nanometer scale to be carried out in the hard x-ray region.« less