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Title: Metrology For High-Frequency Nanoelectronics

Abstract

Two metrological tools for high-frequency measurements of nanoscale systems are described: (i) two/N-port analysis of nanoscale devices as well as (ii) near-field scanning microwave microscopy (NSMM) for materials characterization. Calibrated two/N-port measurements were made on multiwalled carbon nanotubes (MWNT) welded to a coplanar waveguide. Significant changes in the extracted high-frequency electrical response of the welded MWNT were measured when the contacts to the MWNT were modified. Additionally, NSMM was used to characterize films of nanotube soot deposited on copper and sapphire substrates. The material properties of the films showed a strong dependence on the substrate material.

Authors:
; ; ; ;  [1]
  1. National Institute of Standards and Technology, 325 Broadway, Boulder, CO 80305 (United States)
Publication Date:
OSTI Identifier:
21032732
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 931; Journal Issue: 1; Conference: 2007 international conference on frontiers of characterization and metrology, Gaithersburg, MD (United States), 27-29 Mar 2007; Other Information: DOI: 10.1063/1.2799429; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; CARBON; COPPER; FREQUENCY MEASUREMENT; MICROSCOPY; MICROWAVE RADIATION; NANOTUBES; SAPPHIRE; SOOT; SUBSTRATES; WAVEGUIDES

Citation Formats

Wallis, T. Mitch, Imtiaz, Atif, Nembach, Hans T., Rice, Paul, and Kabos, Pavel. Metrology For High-Frequency Nanoelectronics. United States: N. p., 2007. Web. doi:10.1063/1.2799429.
Wallis, T. Mitch, Imtiaz, Atif, Nembach, Hans T., Rice, Paul, & Kabos, Pavel. Metrology For High-Frequency Nanoelectronics. United States. doi:10.1063/1.2799429.
Wallis, T. Mitch, Imtiaz, Atif, Nembach, Hans T., Rice, Paul, and Kabos, Pavel. 2007. "Metrology For High-Frequency Nanoelectronics". United States. doi:10.1063/1.2799429.
@article{osti_21032732,
title = {Metrology For High-Frequency Nanoelectronics},
author = {Wallis, T. Mitch and Imtiaz, Atif and Nembach, Hans T. and Rice, Paul and Kabos, Pavel},
abstractNote = {Two metrological tools for high-frequency measurements of nanoscale systems are described: (i) two/N-port analysis of nanoscale devices as well as (ii) near-field scanning microwave microscopy (NSMM) for materials characterization. Calibrated two/N-port measurements were made on multiwalled carbon nanotubes (MWNT) welded to a coplanar waveguide. Significant changes in the extracted high-frequency electrical response of the welded MWNT were measured when the contacts to the MWNT were modified. Additionally, NSMM was used to characterize films of nanotube soot deposited on copper and sapphire substrates. The material properties of the films showed a strong dependence on the substrate material.},
doi = {10.1063/1.2799429},
journal = {AIP Conference Proceedings},
number = 1,
volume = 931,
place = {United States},
year = 2007,
month = 9
}
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