A magnetron sputtering system for the preparation of patterned thin films and in situ thin film electrical resistance measurements

Arnalds, U B; Agustsson, J S; Ingason, A S; Eriksson, A K; Gylfason, K B; Gudmundsson, J T; Olafsson, S

doi:10.1063/1.2793508

Title: A magnetron sputtering system for the preparation of patterned thin films and in situ thin film electrical resistance measurements

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Abstract

We describe a versatile three gun magnetron sputtering system with a custom made sample holder for in situ electrical resistance measurements, both during film growth and ambient changes on film electrical properties. The sample holder allows for the preparation of patterned thin film structures, using up to five different shadow masks without breaking vacuum. We show how the system is used to monitor the electrical resistance of thin metallic films during growth and to study the thermodynamics of hydrogen uptake in metallic thin films. Furthermore, we demonstrate the growth of thin film capacitors, where patterned films are created using shadow masks.

Authors:

Arnalds, U B; Agustsson, J S; Ingason, A S; Eriksson, A K; Gylfason, K B; Gudmundsson, J T; Olafsson, S ^[1]

Matvice, Dunhaga 3, IS-107 Reykjavik (Iceland)

Publication Date:: Mon Oct 15 00:00:00 EDT 2007

OSTI Identifier:: 21024444

Resource Type:: Journal Article

Journal Name:: Review of Scientific Instruments

Additional Journal Information:: Journal Volume: 78; Journal Issue: 10; Other Information: DOI: 10.1063/1.2793508; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0034-6748

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; CAPACITORS; CHROMIUM ALLOYS; ELECTRIC CONDUCTIVITY; HYDROGEN; HYDROGENATION; MAGNESIUM; MAGNETRONS; MOLYBDENUM ALLOYS; MONITORS; PLATINUM; RESPIRATORS; SAMPLE HOLDERS; SPUTTERING; SURFACE COATING; THERMODYNAMIC PROPERTIES; THIN FILMS

Citation Formats


                    Arnalds, U B, Agustsson, J S, Ingason, A S, Eriksson, A K, Gylfason, K B, Gudmundsson, J T, Olafsson, S, Mentis Cura ehf., Grandagardi 7, IS-107 Reykjavik, Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik, Microsystem Technology Laboratory, School of Electrical Engineering, KTH-Royal Institute of Technology, SE-100 44 Stockholm, Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik, and Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik. A magnetron sputtering system for the preparation of patterned thin films and in situ thin film electrical resistance measurements.  United States: N. p., 2007. 
        Web.  doi:10.1063/1.2793508.

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                    Arnalds, U B, Agustsson, J S, Ingason, A S, Eriksson, A K, Gylfason, K B, Gudmundsson, J T, Olafsson, S, Mentis Cura ehf., Grandagardi 7, IS-107 Reykjavik, Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik, Microsystem Technology Laboratory, School of Electrical Engineering, KTH-Royal Institute of Technology, SE-100 44 Stockholm, Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik, & Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik. A magnetron sputtering system for the preparation of patterned thin films and in situ thin film electrical resistance measurements.  United States.  https://doi.org/10.1063/1.2793508

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                    Arnalds, U B, Agustsson, J S, Ingason, A S, Eriksson, A K, Gylfason, K B, Gudmundsson, J T, Olafsson, S, Mentis Cura ehf., Grandagardi 7, IS-107 Reykjavik, Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik, Microsystem Technology Laboratory, School of Electrical Engineering, KTH-Royal Institute of Technology, SE-100 44 Stockholm, Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik, and Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik. 2007.  
        "A magnetron sputtering system for the preparation of patterned thin films and in situ thin film electrical resistance measurements".  United States.  https://doi.org/10.1063/1.2793508.

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@article{osti_21024444,

  title        = {A magnetron sputtering system for the preparation of patterned thin films and in situ thin film electrical resistance measurements},

  author       = {Arnalds, U B and Agustsson, J S and Ingason, A S and Eriksson, A K and Gylfason, K B and Gudmundsson, J T and Olafsson, S and Mentis Cura ehf., Grandagardi 7, IS-107 Reykjavik and Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik and Microsystem Technology Laboratory, School of Electrical Engineering, KTH-Royal Institute of Technology, SE-100 44 Stockholm and Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik and Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik},

  abstractNote = {We describe a versatile three gun magnetron sputtering system with a custom made sample holder for in situ electrical resistance measurements, both during film growth and ambient changes on film electrical properties. The sample holder allows for the preparation of patterned thin film structures, using up to five different shadow masks without breaking vacuum. We show how the system is used to monitor the electrical resistance of thin metallic films during growth and to study the thermodynamics of hydrogen uptake in metallic thin films. Furthermore, we demonstrate the growth of thin film capacitors, where patterned films are created using shadow masks.},

  doi          = {10.1063/1.2793508},

  url          = {https://www.osti.gov/biblio/21024444},
  journal      = {Review of Scientific Instruments},

  issn         = {0034-6748},

  number       = 10,

  volume       = 78,

  place        = {United States},

  year         = {Mon Oct 15 00:00:00 EDT 2007},

  month        = {Mon Oct 15 00:00:00 EDT 2007}

}

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