Surface plasmon enhanced ultraviolet emission from ZnO films deposited on Ag/Si(001) by magnetron sputtering

Journal Article · Mon Dec 03 00:00:00 EST 2007 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2822404· OSTI ID:21016196

You, J B; Zhang, X W; Fan, Y M; Qu, S; Chen, N F ^[1]

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1. Key Lab of Semiconductor Materials Science, Institute of Semiconductors, CAS, Beijing 100083 (China)

The ZnO films were grown on Ag/Si(001) substrates by sputtering Ag and ZnO targets successively in a pure Ar ambient. A significant enhancement of ZnO ultraviolet emission and a reduction of its full width of half maximum have been observed while introducing a 100 nm Ag interlayer between ZnO film and Si substrate. Furthermore, a complete suppression of the defect related visible emission was also found for the ZnO/Ag/Si sample. This improved optical performance of ZnO is attributed to the resonant coupling between Ag surface plasmon and ultraviolet emission of ZnO.

• OSTI ID: 21016196
• Journal Information: Applied Physics Letters, Vol. 91, Issue 23; Other Information: DOI: 10.1063/1.2822404; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
DEPOSITION
PHOTOLUMINESCENCE
SEMICONDUCTOR MATERIALS
SILICON
SILVER
SPUTTERING
SUBSTRATES
THIN FILMS
ULTRAVIOLET RADIATION
ZINC OXIDES