Band offsets between amorphous LaAlO{sub 3} and In{sub 0.53}Ga{sub 0.47}As
- Intel Corporation, Santa Clara, California 95052 (United States)
The band offsets between an amorphous LaAlO{sub 3} dielectric prepared by molecular-beam deposition and a n-type In{sub 0.53}Ga{sub 0.47}As (001) layer have been measured using synchrotron radiation photoemission spectroscopy. The valence and conduction band offsets at the postdeposition annealed LaAlO{sub 3}/InGaAs interface are 3.1{+-}0.1 and 2.35{+-}0.2 eV, respectively. The band gap of LaAlO{sub 3}, as determined by Al 2p and O 1s core level energy loss spectra, is 6.2{+-}0.1 eV. Within the resolution of the medium energy ion scattering technique, no interfacial oxide layer is seen between the InGaAs and the 3.6 nm thick amorphous LaAlO{sub 3}.
- OSTI ID:
- 21016155
- Journal Information:
- Applied Physics Letters, Vol. 91, Issue 11; Other Information: DOI: 10.1063/1.2783264; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
ALUMINATES
ANNEALING
CRYSTAL GROWTH
DEPOSITION
DIELECTRIC MATERIALS
ELECTRONS
ENERGY GAP
ENERGY-LOSS SPECTROSCOPY
GALLIUM ARSENIDES
INDIUM ARSENIDES
LANTHANUM COMPOUNDS
LAYERS
MOLECULAR BEAM EPITAXY
MOLECULAR BEAMS
OXIDES
PHOTOELECTRON SPECTROSCOPY
PHOTOEMISSION
SCATTERING
SEMICONDUCTOR MATERIALS
SYNCHROTRON RADIATION
ALUMINATES
ANNEALING
CRYSTAL GROWTH
DEPOSITION
DIELECTRIC MATERIALS
ELECTRONS
ENERGY GAP
ENERGY-LOSS SPECTROSCOPY
GALLIUM ARSENIDES
INDIUM ARSENIDES
LANTHANUM COMPOUNDS
LAYERS
MOLECULAR BEAM EPITAXY
MOLECULAR BEAMS
OXIDES
PHOTOELECTRON SPECTROSCOPY
PHOTOEMISSION
SCATTERING
SEMICONDUCTOR MATERIALS
SYNCHROTRON RADIATION