Spatial-frequency multiplication via absorbance modulation
- Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139 (United States)
The absorbance of a thin film of photochromic material can be reversibly modified by exposure to two different wavelengths, {lambda}{sub 1} and {lambda}{sub 2}. When such a film is illuminated by both wavelengths simultaneously, and the longer wavelength {lambda}{sub 2} possesses a node in its intensity distribution, then the absorbance of the layer can be made high except at an arbitrarily small region near the node. By exploiting the large nonlinearity introduced by this mechanism, combined with the reversibility of the absorbance of the photochromic layer, the authors demonstrate that spatial frequencies larger than those present in incident intensity distributions may be generated. They show photoresist exposures to demonstrate this technique.
- OSTI ID:
- 21016129
- Journal Information:
- Applied Physics Letters, Vol. 91, Issue 9; Other Information: DOI: 10.1063/1.2775092; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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