Large-area, ordered hexagonal arrays of nanoscale holes or dots from block copolymer templates

Journal Article · Mon Oct 01 00:00:00 EDT 2007 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2794010· OSTI ID:21013675

Vedrine, Josee; Hong, Young-Rae; Marencic, Andrew P; Register, Richard A; Adamson, Douglas H; Chaikin, Paul M ^[1]

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1. Department of Chemical Engineering, Princeton University, Princeton, New Jersey 08544 (United States)

Hexagonal arrays of nanoscale holes or metal dots (25 nm in diameter and 39 nm in period), with orientational order extending over the entire square-centimeter array area, were fabricated on unpatterned silicon wafer substrates using a shear-aligned sphere-forming diblock copolymer template. Since two or more layers of spherical nanodomains are required to achieve alignment in the block copolymer film, but pattern transfer requires a single layer, a multistep etching process was developed, whereby the top layer of a shear-aligned bilayer was evenly removed, leaving the ordered bottom layer as the fabrication template for hole and dot arrays free from grain boundaries.

• OSTI ID: 21013675
• Journal Information: Applied Physics Letters, Vol. 91, Issue 14; Other Information: DOI: 10.1063/1.2794010; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
COPOLYMERS
ETCHING
FABRICATION
FILMS
GOLD
GRAIN BOUNDARIES
LAYERS
QUANTUM DOTS
SEMICONDUCTOR MATERIALS
SILICON
SPHERES
SPHERICAL CONFIGURATION
SUBSTRATES