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Title: Investigation of the photochemistry of the poly{l_brace}p-phenylenevinylene{r_brace} precursor system: Implications for nanolithography

Abstract

The photochemistry of poly{l_brace}p-phenylene[1-(tetrahydrothiophen-1-io)ethylene chloride]{r_brace} (PPTEC), a water soluble precursor of the semiconducting polymer, poly{l_brace}p-phenylenevinylene{r_brace} (PPV), has been studied both under atmospheric conditions and in environments devoid of oxygen. UV-visible spectroscopy and photoluminescence data has been used to provide a picture of the mechanistic pathways involved in UV irradiation of the PPTEC material. A new quantitative model for the effect of UV irradiation upon film morphology is presented, which leads to insights for the improved control of the characteristics of PPV nanostructures produced via near-field scanning optical lithography.

Authors:
; ; ;  [1]
  1. Centre for Organic Electronics, University of Newcastle, Callaghan, NSW 2308 (Australia)
Publication Date:
OSTI Identifier:
20991261
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Chemical Physics; Journal Volume: 126; Journal Issue: 17; Other Information: DOI: 10.1063/1.2727477; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; NANOSTRUCTURES; ORGANIC CHLORINE COMPOUNDS; ORGANIC POLYMERS; ORGANIC SEMICONDUCTORS; PHOTOCHEMISTRY; PHOTOLUMINESCENCE; PRECURSOR; SCANNING LIGHT MICROSCOPY; SPECTROSCOPY; THIN FILMS; ULTRAVIOLET RADIATION

Citation Formats

Cotton, D. V., Fell, C. J., Belcher, W. J., and Dastoor, P. C.. Investigation of the photochemistry of the poly{l_brace}p-phenylenevinylene{r_brace} precursor system: Implications for nanolithography. United States: N. p., 2007. Web. doi:10.1063/1.2727477.
Cotton, D. V., Fell, C. J., Belcher, W. J., & Dastoor, P. C.. Investigation of the photochemistry of the poly{l_brace}p-phenylenevinylene{r_brace} precursor system: Implications for nanolithography. United States. doi:10.1063/1.2727477.
Cotton, D. V., Fell, C. J., Belcher, W. J., and Dastoor, P. C.. Mon . "Investigation of the photochemistry of the poly{l_brace}p-phenylenevinylene{r_brace} precursor system: Implications for nanolithography". United States. doi:10.1063/1.2727477.
@article{osti_20991261,
title = {Investigation of the photochemistry of the poly{l_brace}p-phenylenevinylene{r_brace} precursor system: Implications for nanolithography},
author = {Cotton, D. V. and Fell, C. J. and Belcher, W. J. and Dastoor, P. C.},
abstractNote = {The photochemistry of poly{l_brace}p-phenylene[1-(tetrahydrothiophen-1-io)ethylene chloride]{r_brace} (PPTEC), a water soluble precursor of the semiconducting polymer, poly{l_brace}p-phenylenevinylene{r_brace} (PPV), has been studied both under atmospheric conditions and in environments devoid of oxygen. UV-visible spectroscopy and photoluminescence data has been used to provide a picture of the mechanistic pathways involved in UV irradiation of the PPTEC material. A new quantitative model for the effect of UV irradiation upon film morphology is presented, which leads to insights for the improved control of the characteristics of PPV nanostructures produced via near-field scanning optical lithography.},
doi = {10.1063/1.2727477},
journal = {Journal of Chemical Physics},
number = 17,
volume = 126,
place = {United States},
year = {Mon May 07 00:00:00 EDT 2007},
month = {Mon May 07 00:00:00 EDT 2007}
}