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Title: Optical properties of sputtered amorphous beryllium nitride thin films

Abstract

The optical properties of amorphous beryllium nitride (a-Be{sub 3}N{sub 2}) thin films deposited on Si (100) at temperature <50 degree sign C using reactive rf sputtering deposition were examined in the wavelength range of 280-1600 nm. X-ray diffraction of the films showed no structure, suggesting the Be{sub 3}N{sub 2} films grown on the Si (100) substrates are amorphous. The thicknesses and optical constants of the films were derived from variable-angle spectroscopic ellipsometry measurements using the Cauchy-Urbach model. Refractive indices and extinction coefficients of the films were determined to be in the range n=1.98-2.28 and {kappa}=0.0002-0.08, respectively. Analysis of the absorption coefficient shows the optical absorption edge of a-Be{sub 3}N{sub 2} films to be 4.12{+-}0.01 eV. These values were in excellent agreement with the photoluminescence measurements (4.18 eV). The surface morphology was characterized by atomic force microscopy. The surfaces of the films were very smooth and their average roughnesses were measured to be in the range of 0.36-2.4 nm. An effective medium approximation model of 50% Be{sub 3}N{sub 2} and 50% voids was used in the ellipsometric fitting procedure. The spectral dependence of transmissivity of the films was investigated at different angles of incidence (20 degree sign -80 degree sign ).more » The a-Be{sub 3}N{sub 2} films shown high transmissivity (80%-99%) in the visible and near infrared regions.« less

Authors:
; ;  [1];  [2]
  1. Department of Physics, Al-Hussein Bin Talal University, Ma'an (Jordan)
  2. (United States)
Publication Date:
OSTI Identifier:
20982892
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 101; Journal Issue: 10; Other Information: DOI: 10.1063/1.2738393; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ABSORPTION; AMORPHOUS STATE; APPROXIMATIONS; ATOMIC FORCE MICROSCOPY; BERYLLIUM NITRIDES; ELLIPSOMETRY; EV RANGE 01-10; INCIDENCE ANGLE; MORPHOLOGY; PHOTOLUMINESCENCE; REFRACTIVE INDEX; ROUGHNESS; SPUTTERING; SUBSTRATES; SURFACE COATING; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE 0273-0400 K; THICKNESS; THIN FILMS; X-RAY DIFFRACTION

Citation Formats

Khoshman, J. M., Khan, A., Kordesch, M. E., and Department of Physics and Astronomy, Ohio University, Athens, Ohio 45701. Optical properties of sputtered amorphous beryllium nitride thin films. United States: N. p., 2007. Web. doi:10.1063/1.2738393.
Khoshman, J. M., Khan, A., Kordesch, M. E., & Department of Physics and Astronomy, Ohio University, Athens, Ohio 45701. Optical properties of sputtered amorphous beryllium nitride thin films. United States. doi:10.1063/1.2738393.
Khoshman, J. M., Khan, A., Kordesch, M. E., and Department of Physics and Astronomy, Ohio University, Athens, Ohio 45701. Tue . "Optical properties of sputtered amorphous beryllium nitride thin films". United States. doi:10.1063/1.2738393.
@article{osti_20982892,
title = {Optical properties of sputtered amorphous beryllium nitride thin films},
author = {Khoshman, J. M. and Khan, A. and Kordesch, M. E. and Department of Physics and Astronomy, Ohio University, Athens, Ohio 45701},
abstractNote = {The optical properties of amorphous beryllium nitride (a-Be{sub 3}N{sub 2}) thin films deposited on Si (100) at temperature <50 degree sign C using reactive rf sputtering deposition were examined in the wavelength range of 280-1600 nm. X-ray diffraction of the films showed no structure, suggesting the Be{sub 3}N{sub 2} films grown on the Si (100) substrates are amorphous. The thicknesses and optical constants of the films were derived from variable-angle spectroscopic ellipsometry measurements using the Cauchy-Urbach model. Refractive indices and extinction coefficients of the films were determined to be in the range n=1.98-2.28 and {kappa}=0.0002-0.08, respectively. Analysis of the absorption coefficient shows the optical absorption edge of a-Be{sub 3}N{sub 2} films to be 4.12{+-}0.01 eV. These values were in excellent agreement with the photoluminescence measurements (4.18 eV). The surface morphology was characterized by atomic force microscopy. The surfaces of the films were very smooth and their average roughnesses were measured to be in the range of 0.36-2.4 nm. An effective medium approximation model of 50% Be{sub 3}N{sub 2} and 50% voids was used in the ellipsometric fitting procedure. The spectral dependence of transmissivity of the films was investigated at different angles of incidence (20 degree sign -80 degree sign ). The a-Be{sub 3}N{sub 2} films shown high transmissivity (80%-99%) in the visible and near infrared regions.},
doi = {10.1063/1.2738393},
journal = {Journal of Applied Physics},
number = 10,
volume = 101,
place = {United States},
year = {Tue May 15 00:00:00 EDT 2007},
month = {Tue May 15 00:00:00 EDT 2007}
}