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Title: Effect of hydrogen treatment on the field emission of amorphous carbon film

Abstract

The field emission characteristics of amorphous carbon (a-C) films are studied before and after H plasma treatment. It is found that H plasma treatment lowered the turn-on field and improved the field emission uniformity. Surface sp{sup 2}/sp{sup 3} ratio, work function, and topography of the a-C films before and after H plasma treatment are studied using Raman spectroscopy, Kelvin probe, and atomic force microscopy, respectively. The results show that the etching effect of H plasma on a-C film is obvious, which is different from those of diamond and tetrahedral amorphous carbon (ta-C) films. We suggest that the surface component change and nanostructure of treated a-C films cause electron injection from sp{sup 2} sites to surface sp{sup 3} sites which are responsible for low macroelectrical field emission.

Authors:
; ; ; ; ;  [1];  [2]
  1. State Key Laboratory of Optoelectronic Materials and Technologies, School of Physics and Engineering, Sun Yat-Sen (Zhongshan) University, Guangzhou 510275 (China)
  2. (Zhongshan) University, Guangzhou 510275 (China)
Publication Date:
OSTI Identifier:
20982832
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 101; Journal Issue: 8; Other Information: DOI: 10.1063/1.2724426; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; AMORPHOUS STATE; ATOMIC FORCE MICROSCOPY; DIAMONDS; ELECTRON BEAM INJECTION; ETCHING; FIELD EMISSION; HYDROGEN; NANOSTRUCTURES; PLASMA; RAMAN SPECTRA; RAMAN SPECTROSCOPY; THIN FILMS; TOPOGRAPHY; WORK FUNCTIONS

Citation Formats

Xie, W. G., Chen, Jun, Chen, Jian, Deng, S. Z., She, J. C., Xu, N. S., and Guangdong Province Key Laboratory of Display Materials and Technologies, School of Physics and Engineering, Sun Yat-Sen. Effect of hydrogen treatment on the field emission of amorphous carbon film. United States: N. p., 2007. Web. doi:10.1063/1.2724426.
Xie, W. G., Chen, Jun, Chen, Jian, Deng, S. Z., She, J. C., Xu, N. S., & Guangdong Province Key Laboratory of Display Materials and Technologies, School of Physics and Engineering, Sun Yat-Sen. Effect of hydrogen treatment on the field emission of amorphous carbon film. United States. doi:10.1063/1.2724426.
Xie, W. G., Chen, Jun, Chen, Jian, Deng, S. Z., She, J. C., Xu, N. S., and Guangdong Province Key Laboratory of Display Materials and Technologies, School of Physics and Engineering, Sun Yat-Sen. Sun . "Effect of hydrogen treatment on the field emission of amorphous carbon film". United States. doi:10.1063/1.2724426.
@article{osti_20982832,
title = {Effect of hydrogen treatment on the field emission of amorphous carbon film},
author = {Xie, W. G. and Chen, Jun and Chen, Jian and Deng, S. Z. and She, J. C. and Xu, N. S. and Guangdong Province Key Laboratory of Display Materials and Technologies, School of Physics and Engineering, Sun Yat-Sen},
abstractNote = {The field emission characteristics of amorphous carbon (a-C) films are studied before and after H plasma treatment. It is found that H plasma treatment lowered the turn-on field and improved the field emission uniformity. Surface sp{sup 2}/sp{sup 3} ratio, work function, and topography of the a-C films before and after H plasma treatment are studied using Raman spectroscopy, Kelvin probe, and atomic force microscopy, respectively. The results show that the etching effect of H plasma on a-C film is obvious, which is different from those of diamond and tetrahedral amorphous carbon (ta-C) films. We suggest that the surface component change and nanostructure of treated a-C films cause electron injection from sp{sup 2} sites to surface sp{sup 3} sites which are responsible for low macroelectrical field emission.},
doi = {10.1063/1.2724426},
journal = {Journal of Applied Physics},
number = 8,
volume = 101,
place = {United States},
year = {Sun Apr 15 00:00:00 EDT 2007},
month = {Sun Apr 15 00:00:00 EDT 2007}
}
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