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Title: Probe diagnostics of argon-oxygen-tetramethyltin capacitively coupled plasmas for the deposition of tin oxide thin films

Abstract

Langmuir probe measurements in nondepositing and depositing rf capacitively coupled (CCP) plasmas are briefly reviewed and compared to the results obtained in our rf system used for the deposition of tin oxide (SnO{sub 2}) thin films from argon-oxygen-tetamethyltin [Sn(CH{sub 3}){sub 4}] plasmas. Typically in our experimental conditions for tin oxide deposition, values of kT{sub eff}= 1.2-1.5 eV and n{sub e}=3-5x10{sup 9} cm{sup -3} were measured. These values are consistent with those generally reported in other depositing discharges. The shape of the electron energy probability function (EEPF), obtained from the Druyvesteyn procedure, was discussed too. As a consequence of the two electron heating mechanisms in capacitively coupled discharges, that is, ohmic and stochastic heating, the electrons have a bi-Maxwellian EEPF at low pressure (in the range of 10-100 mTorr). Moreover, a deep 'hole' appears in the EEPF at the energy which could correspond to the resonant peak of the vibrational excitation cross section of some molecules which can be present in the discharge, such as N{sub 2}, CH{sub 4}, or CO.

Authors:
; ;  [1]
  1. Laboratoire de Genie des procedes Plasmas, Ecole Nationale Superieure de Chimie Paris, Universite Pierre et Marie Curie, Paris 6 (France)
Publication Date:
OSTI Identifier:
20982791
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 101; Journal Issue: 7; Other Information: DOI: 10.1063/1.2561749; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ARGON; CARBON MONOXIDE; CHEMICAL VAPOR DEPOSITION; COATINGS; CROSS SECTIONS; ELECTRONS; EV RANGE 01-10; EXCITATION; HEATING; HIGH-FREQUENCY DISCHARGES; LANGMUIR PROBE; METHANE; OXYGEN; PLASMA; PROBABILITY; RF SYSTEMS; STOCHASTIC PROCESSES; THIN FILMS; TIN OXIDES

Citation Formats

Pulpytel, J., Morscheidt, W., and Arefi-Khonsari, F. Probe diagnostics of argon-oxygen-tetramethyltin capacitively coupled plasmas for the deposition of tin oxide thin films. United States: N. p., 2007. Web. doi:10.1063/1.2561749.
Pulpytel, J., Morscheidt, W., & Arefi-Khonsari, F. Probe diagnostics of argon-oxygen-tetramethyltin capacitively coupled plasmas for the deposition of tin oxide thin films. United States. doi:10.1063/1.2561749.
Pulpytel, J., Morscheidt, W., and Arefi-Khonsari, F. Sun . "Probe diagnostics of argon-oxygen-tetramethyltin capacitively coupled plasmas for the deposition of tin oxide thin films". United States. doi:10.1063/1.2561749.
@article{osti_20982791,
title = {Probe diagnostics of argon-oxygen-tetramethyltin capacitively coupled plasmas for the deposition of tin oxide thin films},
author = {Pulpytel, J. and Morscheidt, W. and Arefi-Khonsari, F.},
abstractNote = {Langmuir probe measurements in nondepositing and depositing rf capacitively coupled (CCP) plasmas are briefly reviewed and compared to the results obtained in our rf system used for the deposition of tin oxide (SnO{sub 2}) thin films from argon-oxygen-tetamethyltin [Sn(CH{sub 3}){sub 4}] plasmas. Typically in our experimental conditions for tin oxide deposition, values of kT{sub eff}= 1.2-1.5 eV and n{sub e}=3-5x10{sup 9} cm{sup -3} were measured. These values are consistent with those generally reported in other depositing discharges. The shape of the electron energy probability function (EEPF), obtained from the Druyvesteyn procedure, was discussed too. As a consequence of the two electron heating mechanisms in capacitively coupled discharges, that is, ohmic and stochastic heating, the electrons have a bi-Maxwellian EEPF at low pressure (in the range of 10-100 mTorr). Moreover, a deep 'hole' appears in the EEPF at the energy which could correspond to the resonant peak of the vibrational excitation cross section of some molecules which can be present in the discharge, such as N{sub 2}, CH{sub 4}, or CO.},
doi = {10.1063/1.2561749},
journal = {Journal of Applied Physics},
number = 7,
volume = 101,
place = {United States},
year = {Sun Apr 01 00:00:00 EDT 2007},
month = {Sun Apr 01 00:00:00 EDT 2007}
}