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Title: Investigation of the interaction of a laser pulse with a preformed Gaussian Sn plume for an extreme ultraviolet lithography source

Abstract

The interaction of a laser pulse with a Sn preplasma formed by a low energy prepulse was investigated for an extreme ultraviolet (EUV) lithography light source. A much lower ion kinetic energy and nearly the same conversion efficiency from laser to in-band (2% bandwidth) 13.5 nm EUV light were simultaneously observed as compared with those from the direct interaction with a solid surface. The reason comes from the interaction of the laser pulse with a smooth preplume induced by the prepulse. The density profile of the preplume was measured with time-resolved shadowgraphy and could be fitted with a Gaussian function. The energy of the ions located at the flux peak E{sub p} scales with the length of the preplume l{sub s} as E{sub p}{proportional_to}1/l{sub s}. Laser absorption in the low-density preplume and ion acceleration during plasma expansion are discussed. This result provides a general way to control particle energy from a laser plasma interaction.

Authors:
; ; ; ;  [1];  [2]
  1. Department of Mechanical and Aerospace Engineering, University of California, San Diego, 9500 Gilman Drive, La Jolla, California 92093-0438 (United States)
  2. (United States)
Publication Date:
OSTI Identifier:
20982628
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 101; Journal Issue: 2; Other Information: DOI: 10.1063/1.2426883; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ABSORPTION; ACCELERATION; EXTREME ULTRAVIOLET RADIATION; GAUSS FUNCTION; KINETIC ENERGY; LASERS; LIGHT SOURCES; LIGHT TRANSMISSION; PLASMA; PLASMA DENSITY; PLASMA DIAGNOSTICS; PLASMA EXPANSION; PLUMES; PULSES; TIME RESOLUTION; TIN

Citation Formats

Tao, Y., Tillack, M. S., Harilal, S. S., Sequoia, K. L., Najmabadi, F., and Center for Energy Research, University of California, San Diego, 9500 Gilman Drive, La Jolla, California 92093-0438. Investigation of the interaction of a laser pulse with a preformed Gaussian Sn plume for an extreme ultraviolet lithography source. United States: N. p., 2007. Web. doi:10.1063/1.2426883.
Tao, Y., Tillack, M. S., Harilal, S. S., Sequoia, K. L., Najmabadi, F., & Center for Energy Research, University of California, San Diego, 9500 Gilman Drive, La Jolla, California 92093-0438. Investigation of the interaction of a laser pulse with a preformed Gaussian Sn plume for an extreme ultraviolet lithography source. United States. doi:10.1063/1.2426883.
Tao, Y., Tillack, M. S., Harilal, S. S., Sequoia, K. L., Najmabadi, F., and Center for Energy Research, University of California, San Diego, 9500 Gilman Drive, La Jolla, California 92093-0438. Mon . "Investigation of the interaction of a laser pulse with a preformed Gaussian Sn plume for an extreme ultraviolet lithography source". United States. doi:10.1063/1.2426883.
@article{osti_20982628,
title = {Investigation of the interaction of a laser pulse with a preformed Gaussian Sn plume for an extreme ultraviolet lithography source},
author = {Tao, Y. and Tillack, M. S. and Harilal, S. S. and Sequoia, K. L. and Najmabadi, F. and Center for Energy Research, University of California, San Diego, 9500 Gilman Drive, La Jolla, California 92093-0438},
abstractNote = {The interaction of a laser pulse with a Sn preplasma formed by a low energy prepulse was investigated for an extreme ultraviolet (EUV) lithography light source. A much lower ion kinetic energy and nearly the same conversion efficiency from laser to in-band (2% bandwidth) 13.5 nm EUV light were simultaneously observed as compared with those from the direct interaction with a solid surface. The reason comes from the interaction of the laser pulse with a smooth preplume induced by the prepulse. The density profile of the preplume was measured with time-resolved shadowgraphy and could be fitted with a Gaussian function. The energy of the ions located at the flux peak E{sub p} scales with the length of the preplume l{sub s} as E{sub p}{proportional_to}1/l{sub s}. Laser absorption in the low-density preplume and ion acceleration during plasma expansion are discussed. This result provides a general way to control particle energy from a laser plasma interaction.},
doi = {10.1063/1.2426883},
journal = {Journal of Applied Physics},
number = 2,
volume = 101,
place = {United States},
year = {Mon Jan 15 00:00:00 EST 2007},
month = {Mon Jan 15 00:00:00 EST 2007}
}