skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Electron beam induced coloration and luminescence in layered structure of WO{sub 3} thin films grown by pulsed dc magnetron sputtering

Abstract

Tungsten oxide thin films have been deposited by pulsed dc magnetron sputtering of tungsten in argon and oxygen atmosphere. The as-deposited WO{sub 3} film is amorphous, highly transparent, and shows a layered structure along the edges. In addition, the optical properties of the as-deposited film show a steplike behavior of extinction coefficient. However, the electron beam irradiation (3.0 keV) of the as-deposited films results in crystallization, coloration (deep blue), and luminescence (intense red emission). The above changes in physical properties are attributed to the extraction of oxygen atoms from the sample and the structural modifications induced by electron bombardment. The present method of coloration and luminescence has a potential for fabricating high-density optical data storage device.

Authors:
;  [1]
  1. Semiconductor Laboratory, Department of Physics, Indian Institute of Technology Madras, Chennai-600036 (India)
Publication Date:
OSTI Identifier:
20979414
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 101; Journal Issue: 11; Other Information: DOI: 10.1063/1.2737957; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; AMORPHOUS STATE; ARGON; ATMOSPHERES; CATHODOLUMINESCENCE; COLOR; COLORATION; CRYSTALLIZATION; ELECTRON BEAMS; KEV RANGE 01-10; MAGNETRONS; MEMORY DEVICES; OPACITY; OXYGEN; SPUTTERING; SURFACE COATING; THIN FILMS; TUNGSTEN; TUNGSTEN OXIDES

Citation Formats

Karuppasamy, A., and Subrahmanyam, A.. Electron beam induced coloration and luminescence in layered structure of WO{sub 3} thin films grown by pulsed dc magnetron sputtering. United States: N. p., 2007. Web. doi:10.1063/1.2737957.
Karuppasamy, A., & Subrahmanyam, A.. Electron beam induced coloration and luminescence in layered structure of WO{sub 3} thin films grown by pulsed dc magnetron sputtering. United States. doi:10.1063/1.2737957.
Karuppasamy, A., and Subrahmanyam, A.. Fri . "Electron beam induced coloration and luminescence in layered structure of WO{sub 3} thin films grown by pulsed dc magnetron sputtering". United States. doi:10.1063/1.2737957.
@article{osti_20979414,
title = {Electron beam induced coloration and luminescence in layered structure of WO{sub 3} thin films grown by pulsed dc magnetron sputtering},
author = {Karuppasamy, A. and Subrahmanyam, A.},
abstractNote = {Tungsten oxide thin films have been deposited by pulsed dc magnetron sputtering of tungsten in argon and oxygen atmosphere. The as-deposited WO{sub 3} film is amorphous, highly transparent, and shows a layered structure along the edges. In addition, the optical properties of the as-deposited film show a steplike behavior of extinction coefficient. However, the electron beam irradiation (3.0 keV) of the as-deposited films results in crystallization, coloration (deep blue), and luminescence (intense red emission). The above changes in physical properties are attributed to the extraction of oxygen atoms from the sample and the structural modifications induced by electron bombardment. The present method of coloration and luminescence has a potential for fabricating high-density optical data storage device.},
doi = {10.1063/1.2737957},
journal = {Journal of Applied Physics},
number = 11,
volume = 101,
place = {United States},
year = {Fri Jun 01 00:00:00 EDT 2007},
month = {Fri Jun 01 00:00:00 EDT 2007}
}