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Title: Crystalline alumina coatings by reactive ac magnetron sputtering

Abstract

Alumina coatings were deposited on silicon (111 orientation) substrates by reactive ac magnetron sputtering. Film deposition was done using Al targets and three O{sub 2}/Ar gas flow rate ratios at 5 kW power. X-ray diffraction studies showed that films were crystalline and contained several phases of alumina. Secondary ion mass spectroscopy analyses were used to measure O/Al atomic ratio and Ar and H concentrations in the films. Hydrogen content in the coatings depended on the O{sub 2} partial pressure used during sputtering and also on the arrival rate of Al and O species on the substrates and seemed to influence the crystallinity of the coatings.

Authors:
;  [1]
  1. Department of Mechanical Engineering, University of Arkansas, Fayetteville, Arkansas 72701 (United States)
Publication Date:
OSTI Identifier:
20979400
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films; Journal Volume: 25; Journal Issue: 2; Other Information: DOI: 10.1116/1.2431353; (c) 2007 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ALUMINIUM OXIDES; FILMS; GAS FLOW; HYDROGEN; ION MICROPROBE ANALYSIS; MAGNETRONS; MASS SPECTRA; MASS SPECTROSCOPY; PARTIAL PRESSURE; SILICON; SPUTTERING; SUBSTRATES; SURFACE COATING; X-RAY DIFFRACTION

Citation Formats

Khanna, Atul, and Bhat, Deepak G. Crystalline alumina coatings by reactive ac magnetron sputtering. United States: N. p., 2007. Web. doi:10.1116/1.2431353.
Khanna, Atul, & Bhat, Deepak G. Crystalline alumina coatings by reactive ac magnetron sputtering. United States. doi:10.1116/1.2431353.
Khanna, Atul, and Bhat, Deepak G. Thu . "Crystalline alumina coatings by reactive ac magnetron sputtering". United States. doi:10.1116/1.2431353.
@article{osti_20979400,
title = {Crystalline alumina coatings by reactive ac magnetron sputtering},
author = {Khanna, Atul and Bhat, Deepak G.},
abstractNote = {Alumina coatings were deposited on silicon (111 orientation) substrates by reactive ac magnetron sputtering. Film deposition was done using Al targets and three O{sub 2}/Ar gas flow rate ratios at 5 kW power. X-ray diffraction studies showed that films were crystalline and contained several phases of alumina. Secondary ion mass spectroscopy analyses were used to measure O/Al atomic ratio and Ar and H concentrations in the films. Hydrogen content in the coatings depended on the O{sub 2} partial pressure used during sputtering and also on the arrival rate of Al and O species on the substrates and seemed to influence the crystallinity of the coatings.},
doi = {10.1116/1.2431353},
journal = {Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films},
number = 2,
volume = 25,
place = {United States},
year = {Thu Mar 15 00:00:00 EDT 2007},
month = {Thu Mar 15 00:00:00 EDT 2007}
}