Photosynthesis and structure of electroless Ni-P films by synchrotron x-ray irradiation
- Institute of Physics, Academia Sinica, NanKang, Taipei 115, Taiwan and Department of Materials Science and Engineering, National Taiwan University, Taipei 106, Taiwan (China)
The authors describe an electroless deposition method for thin films, based on the irradiation by an x-ray beam emitted by a synchrotron source. Specifically, Ni-P films were deposited at room temperature. This synthesis is a unique combination of photochemical and electrochemical processes. The influence of the pH value on the formation and structural properties of the films was examined by various characterization tools including scanning electron microscopy, x-ray diffraction, and x-ray absorption spectroscopy. Real time monitoring of the deposition process by coherent x-ray microscopy reveals that the formation of hydrogen bubbles leads to a self-catalysis effect without a preexisting catalyst. The mechanisms underlying the deposition process are discussed in details.
- OSTI ID:
- 20979376
- Journal Information:
- Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Vol. 25, Issue 3; Other Information: DOI: 10.1116/1.2731349; (c) 2007 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1553-1813
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
ABSORPTION SPECTROSCOPY
BUBBLES
CATALYSIS
ELECTRODEPOSITION
HYDROGEN
IRRADIATION
NICKEL COMPOUNDS
PH VALUE
PHOTOSYNTHESIS
SCANNING ELECTRON MICROSCOPY
SYNCHROTRON RADIATION SOURCES
SYNCHROTRONS
TEMPERATURE RANGE 0273-0400 K
THIN FILMS
X RADIATION
X-RAY DIFFRACTION
X-RAY SPECTRA
X-RAY SPECTROSCOPY