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Title: Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films

Abstract

CrN films were prepared on steel substrates by a hybrid method utilizing filtered cathodic arc for Cr ion pretreatment and magnetron sputtering for coating deposition. During pretreatment the substrates were biased to -1200 V and exposed to filtered chromium plasma. The substrate-coating interface formed during the pretreatment contained a Cr-enriched modified layer with composition that was strongly influenced by the temperature of the substrate as observed by scanning transmission electron microscopy--energy dispersive spectroscopy. The modified layer had a nanocrystalline morphology and thickness of 15 nm. The path of formation of the layer is linked to the combined action of implantation, diffusion, and resputtering. The resulting adhesion of 3 {mu}m thick CrN films was very high with scratch test critical load values of 83 N. The morphology of the films was smooth without large scale defects and the microstructure was columnar. The coatings behaved well in dry sliding tests with very low wear coefficients of 2.3x10{sup -16} m{sup 3} N{sup -1} m{sup -1}, which can be linked to the high adhesion and defect-free microstructure. The smooth coatings also had a high resistance to corrosion as demonstrated by potentiodynamic tests with particularly high pitting potentials of +800 mV.

Authors:
; ;  [1];  [2];  [2]
  1. Materials and Engineering Research Institute, Sheffield Hallam University, Howard St., Sheffield S1 1WB (United Kingdom)
  2. (United States)
Publication Date:
OSTI Identifier:
20979371
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films; Journal Volume: 25; Journal Issue: 3; Other Information: DOI: 10.1116/1.2730512; (c) 2007 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ADHESION; CHROMIUM; CHROMIUM IONS; CHROMIUM NITRIDES; CORROSION RESISTANCE; CRYSTAL STRUCTURE; ETCHING; FILMS; LAYERS; MICROSTRUCTURE; MORPHOLOGY; NANOSTRUCTURES; SCANNING ELECTRON MICROSCOPY; SPUTTERING; STEELS; SUBSTRATES; SURFACE COATING; THICKNESS; TRANSMISSION ELECTRON MICROSCOPY

Citation Formats

Ehiasarian, A. P., Anders, A., Petrov, I., Lawrence Berkeley National Laboratory, Berkeley, California 94720, and Frederick Seitz Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801. Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films. United States: N. p., 2007. Web. doi:10.1116/1.2730512.
Ehiasarian, A. P., Anders, A., Petrov, I., Lawrence Berkeley National Laboratory, Berkeley, California 94720, & Frederick Seitz Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801. Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films. United States. doi:10.1116/1.2730512.
Ehiasarian, A. P., Anders, A., Petrov, I., Lawrence Berkeley National Laboratory, Berkeley, California 94720, and Frederick Seitz Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801. Tue . "Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films". United States. doi:10.1116/1.2730512.
@article{osti_20979371,
title = {Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films},
author = {Ehiasarian, A. P. and Anders, A. and Petrov, I. and Lawrence Berkeley National Laboratory, Berkeley, California 94720 and Frederick Seitz Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801},
abstractNote = {CrN films were prepared on steel substrates by a hybrid method utilizing filtered cathodic arc for Cr ion pretreatment and magnetron sputtering for coating deposition. During pretreatment the substrates were biased to -1200 V and exposed to filtered chromium plasma. The substrate-coating interface formed during the pretreatment contained a Cr-enriched modified layer with composition that was strongly influenced by the temperature of the substrate as observed by scanning transmission electron microscopy--energy dispersive spectroscopy. The modified layer had a nanocrystalline morphology and thickness of 15 nm. The path of formation of the layer is linked to the combined action of implantation, diffusion, and resputtering. The resulting adhesion of 3 {mu}m thick CrN films was very high with scratch test critical load values of 83 N. The morphology of the films was smooth without large scale defects and the microstructure was columnar. The coatings behaved well in dry sliding tests with very low wear coefficients of 2.3x10{sup -16} m{sup 3} N{sup -1} m{sup -1}, which can be linked to the high adhesion and defect-free microstructure. The smooth coatings also had a high resistance to corrosion as demonstrated by potentiodynamic tests with particularly high pitting potentials of +800 mV.},
doi = {10.1116/1.2730512},
journal = {Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films},
number = 3,
volume = 25,
place = {United States},
year = {Tue May 15 00:00:00 EDT 2007},
month = {Tue May 15 00:00:00 EDT 2007}
}
  • CrN films were prepared on steel substrates by a hybridmethod utilizing filtered cathodic arc for Cr ion pretreatment andmagnetron sputtering for coating deposition. During pretreatment thesubstrates were biased to -1200 V and exposed to filtered chromiumplasma. The substrate-coating interface formed during the pretreatmentcontained a Cr-enriched modified layer withcomposition that was stronglyinfluenced by the temperature of the substrate as observed by scanningtransmission electron microscopy--energy dispersive spectroscopy. Themodified layer had a nanocrystalline morphology and thickness of 15 nm.The path of formation of the layer is linked to the combined action ofimplantation, diffusion, and resputtering. The resulting adhesion of 3 mum thick CrNmore » films was very high with scratch test critical load values of83 N. The morphology of the films was smooth without large scale defectsand the microstructure was columnar. The coatings behaved well in drysliding tests with very low wear coefficients of 2.3 x 10-16 m3 N-1m-1,whichcan be linked to the high adhesion and defect-free microstructure.The smooth coatings also had a high resistance to corrosion asdemonstrated by potentiodynamic tests with particularly high pittingpotentials of +800 mV.« less
  • CrN films were prepared on steel substrates by a hybridmethod utilizing filtered cathodic arc for Cr ion pretreatment andmagnetron sputtering for coating deposition. During pretreatment thesubstrates were biased to -1200 V and exposed to filtered chromiumplasma. The substrate-coating interface formed during the pretreatmentcontained a Cr-enriched modified layer with composition that was stronglyinfluenced by the temperature of the substrate as observed by scanningtransmission electron microscopy--energy dispersive spectroscopy. Themodified layer had a nanocrystalline morphology and thickness of 15 nm.The path of formation of the layer is linked to the combined action ofimplantation, diffusion, and resputtering. The resulting adhesion of 3 mum thickmore » CrN films was very high with scratch test critical load values of83 N. The morphology of the films was smooth without large scale defectsand the microstructure was columnar. The coatings behaved well in drysliding tests with very low wear coefficients of 2.3 x 10-16 m3 N-1m-1,whichcan be linked to the high adhesion and defect-free microstructure.The smooth coatings also had a high resistance to corrosion asdemonstrated by potentiodynamic tests with particularly high pittingpotentials of +800 mV.« less
  • The graphite macroparticle filtering efficiency of three different magnetic filter designs (straight duct, toroidal duct, and 90[degree] free-standing solenoid) used in the filtered cathodic vacuum arc deposition of tetrahedral amorphous carbon (ta-C) films was investigated. The particle contents in the coatings were measured using scanning electron microscopy (SEM) technique. In addition, during the ta-C deposition, long time exposure photographs were taken to see the graphite macroparticle trajectories and thus to qualitatively evaluate the filtering performance of different magnetic filters. The particle density measurements from the SEM images show that the filtering efficiency of the 90[degree] free-standing solenoid design is 13more » times better than the filtering efficiency of the straight duct design. However, the toroidal duct design had only 3 times higher filtering efficiency compared to the straight duct design. [copyright] [ital 1999 American Vacuum Society.]« less
  • No abstract prepared.
  • Molybdenum-containing amorphous carbon (a-C:Mo) thin films were prepared using a dual-cathode filtered cathodic arc plasma source with a molybdenum and a carbon (graphite) cathode. The Mo content in the films was controlled by varying the deposition pulse ratio of Mo and C. Film sheet resistance was measured in situ at process temperature, which was close to room temperature, as well as ex situ as a function of temperature (300-515 K) in ambient air. Film resistivity and electrical activation energy were derived for different Mo and C ratios and substrate bias. Film thickness was in the range 8-28 nm. Film resistivitymore » varied from 3.55x10-4 Omega m to 2.27x10-6 Omega m when the Mo/C pulse ratio was increased from 0.05 to 0.4, with no substrate bias applied. With carbon-selective bias, the film resistivity was in the range of 4.59x10-2 and 4.05 Omega m at a Mo/C pulse ratio of 0.05. The electrical activation energy decreased from 3.80x10-2 to 3.36x10-4 eV when the Mo/C pulse ratio was increased in the absence of bias, and from 0.19 to 0.14 eV for carbon-selective bias conditions. The resistivity of the film shifts systematically with the amounts of Mo and upon application of substrate bias voltage. The intensity ratio of the Raman D-peak and G-peak (ID/IG) correlated with the pre-exponential factor (sigma 0) which included charge carrier density and density of states.« less