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Title: Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films

Abstract

CrN films were prepared on steel substrates by a hybrid method utilizing filtered cathodic arc for Cr ion pretreatment and magnetron sputtering for coating deposition. During pretreatment the substrates were biased to -1200 V and exposed to filtered chromium plasma. The substrate-coating interface formed during the pretreatment contained a Cr-enriched modified layer with composition that was strongly influenced by the temperature of the substrate as observed by scanning transmission electron microscopy--energy dispersive spectroscopy. The modified layer had a nanocrystalline morphology and thickness of 15 nm. The path of formation of the layer is linked to the combined action of implantation, diffusion, and resputtering. The resulting adhesion of 3 {mu}m thick CrN films was very high with scratch test critical load values of 83 N. The morphology of the films was smooth without large scale defects and the microstructure was columnar. The coatings behaved well in dry sliding tests with very low wear coefficients of 2.3x10{sup -16} m{sup 3} N{sup -1} m{sup -1}, which can be linked to the high adhesion and defect-free microstructure. The smooth coatings also had a high resistance to corrosion as demonstrated by potentiodynamic tests with particularly high pitting potentials of +800 mV.

Authors:
; ;  [1];  [2];  [2]
  1. Materials and Engineering Research Institute, Sheffield Hallam University, Howard St., Sheffield S1 1WB (United Kingdom)
  2. (United States)
Publication Date:
OSTI Identifier:
20979371
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films; Journal Volume: 25; Journal Issue: 3; Other Information: DOI: 10.1116/1.2730512; (c) 2007 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ADHESION; CHROMIUM; CHROMIUM IONS; CHROMIUM NITRIDES; CORROSION RESISTANCE; CRYSTAL STRUCTURE; ETCHING; FILMS; LAYERS; MICROSTRUCTURE; MORPHOLOGY; NANOSTRUCTURES; SCANNING ELECTRON MICROSCOPY; SPUTTERING; STEELS; SUBSTRATES; SURFACE COATING; THICKNESS; TRANSMISSION ELECTRON MICROSCOPY

Citation Formats

Ehiasarian, A. P., Anders, A., Petrov, I., Lawrence Berkeley National Laboratory, Berkeley, California 94720, and Frederick Seitz Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801. Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films. United States: N. p., 2007. Web. doi:10.1116/1.2730512.
Ehiasarian, A. P., Anders, A., Petrov, I., Lawrence Berkeley National Laboratory, Berkeley, California 94720, & Frederick Seitz Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801. Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films. United States. doi:10.1116/1.2730512.
Ehiasarian, A. P., Anders, A., Petrov, I., Lawrence Berkeley National Laboratory, Berkeley, California 94720, and Frederick Seitz Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801. Tue . "Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films". United States. doi:10.1116/1.2730512.
@article{osti_20979371,
title = {Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films},
author = {Ehiasarian, A. P. and Anders, A. and Petrov, I. and Lawrence Berkeley National Laboratory, Berkeley, California 94720 and Frederick Seitz Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801},
abstractNote = {CrN films were prepared on steel substrates by a hybrid method utilizing filtered cathodic arc for Cr ion pretreatment and magnetron sputtering for coating deposition. During pretreatment the substrates were biased to -1200 V and exposed to filtered chromium plasma. The substrate-coating interface formed during the pretreatment contained a Cr-enriched modified layer with composition that was strongly influenced by the temperature of the substrate as observed by scanning transmission electron microscopy--energy dispersive spectroscopy. The modified layer had a nanocrystalline morphology and thickness of 15 nm. The path of formation of the layer is linked to the combined action of implantation, diffusion, and resputtering. The resulting adhesion of 3 {mu}m thick CrN films was very high with scratch test critical load values of 83 N. The morphology of the films was smooth without large scale defects and the microstructure was columnar. The coatings behaved well in dry sliding tests with very low wear coefficients of 2.3x10{sup -16} m{sup 3} N{sup -1} m{sup -1}, which can be linked to the high adhesion and defect-free microstructure. The smooth coatings also had a high resistance to corrosion as demonstrated by potentiodynamic tests with particularly high pitting potentials of +800 mV.},
doi = {10.1116/1.2730512},
journal = {Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films},
number = 3,
volume = 25,
place = {United States},
year = {Tue May 15 00:00:00 EDT 2007},
month = {Tue May 15 00:00:00 EDT 2007}
}