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Title: Fundamentals and applications of a plasma-processing system based on electron-beam ionization

Abstract

Plasmas generated from moderate energy (2-5 keV) electron beams (e-beam) have unique, attractive characteristics that are ideal for materials processing applications. These plasmas possess low electron temperatures (<0.5 eV), variable plasma densities (10{sup 9}-10{sup 12} cm{sup -3}) with an improved control of plasma species generation, and perhaps most importantly, a direct scalability to processing areas exceeding one square meter. These characteristics are due to the plasma ionization being driven by the e-beam instead of an external electromagnetic field as used in conventional processing plasma sources. Theoretical and experimental system details are discussed in terms of plasma operating conditions applied to three different surface modification approaches: metal nitriding, negative ion etching, and polymer surface energy tailoring.

Authors:
; ;  [1]
  1. Plasma Physics Division, Naval Research Laboratory, Washington, D.C. 20375-5346 (United States)
Publication Date:
OSTI Identifier:
20975089
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physics of Plasmas; Journal Volume: 14; Journal Issue: 5; Other Information: DOI: 10.1063/1.2712424; (c) 2007 U.S. Government; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ANIONS; ELECTRON BEAMS; ELECTRON TEMPERATURE; ETCHING; EV RANGE; IONIZATION; KEV RANGE; PLASMA; PLASMA DENSITY; POLYMERS; PROCESSING; SURFACE ENERGY; SURFACE HARDENING; TITANIUM

Citation Formats

Leonhardt, D., Walton, S. G., and Fernsler, R. F. Fundamentals and applications of a plasma-processing system based on electron-beam ionization. United States: N. p., 2007. Web. doi:10.1063/1.2712424.
Leonhardt, D., Walton, S. G., & Fernsler, R. F. Fundamentals and applications of a plasma-processing system based on electron-beam ionization. United States. doi:10.1063/1.2712424.
Leonhardt, D., Walton, S. G., and Fernsler, R. F. Tue . "Fundamentals and applications of a plasma-processing system based on electron-beam ionization". United States. doi:10.1063/1.2712424.
@article{osti_20975089,
title = {Fundamentals and applications of a plasma-processing system based on electron-beam ionization},
author = {Leonhardt, D. and Walton, S. G. and Fernsler, R. F.},
abstractNote = {Plasmas generated from moderate energy (2-5 keV) electron beams (e-beam) have unique, attractive characteristics that are ideal for materials processing applications. These plasmas possess low electron temperatures (<0.5 eV), variable plasma densities (10{sup 9}-10{sup 12} cm{sup -3}) with an improved control of plasma species generation, and perhaps most importantly, a direct scalability to processing areas exceeding one square meter. These characteristics are due to the plasma ionization being driven by the e-beam instead of an external electromagnetic field as used in conventional processing plasma sources. Theoretical and experimental system details are discussed in terms of plasma operating conditions applied to three different surface modification approaches: metal nitriding, negative ion etching, and polymer surface energy tailoring.},
doi = {10.1063/1.2712424},
journal = {Physics of Plasmas},
number = 5,
volume = 14,
place = {United States},
year = {Tue May 15 00:00:00 EDT 2007},
month = {Tue May 15 00:00:00 EDT 2007}
}