skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Influence of plasma decay on emission of 147-nm ultraviolet light from discharge cells in the plasma display panel

Abstract

The time profile of 147-nm light emission from a cell discharge of the plasma display panel is investigated in terms of the xenon mole fraction {chi} and the gas pressure p, including the important influences of the diffusion loss of the plasma and the three-body collisions of excited xenon atoms in the resonance state. The light emission profile dY/dt in time is analytically expressed in terms of the gas pressure and xenon mole fraction. The theoretical analysis indicates that the emission intensity increases from zero, reaches its peak, and then decreases, as time goes by. The peak emission intensity (dY/dt){sub p} and the corresponding emission time t{sub p} are obtained analytically in terms of the gas pressure p and xenon mole fraction {chi}. The total emission Y of 147-nm light during each discharge in the cells is proportional to the plasma decay time {tau}. The experimental data are remarkably consistent with the theoretical predictions.

Authors:
; ;  [1];  [2]
  1. Department of Molecular Science and Technology, Ajou University, San 5 Wonchon-Dong, Youngtong-Gu, Suwon 443-749 (Korea, Republic of)
  2. (Korea, Republic of)
Publication Date:
OSTI Identifier:
20974946
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physics of Plasmas; Journal Volume: 14; Journal Issue: 4; Other Information: DOI: 10.1063/1.2715545; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; COLLISIONS; DIFFUSION; ELECTRIC DISCHARGES; EMISSION; PLASMA; ULTRAVIOLET RADIATION; XENON

Citation Formats

Uhm, Han S., Yoo, Naleum, Choi, Eun H., and PDP Research Center, Department of Electrophysics, Kwangwoon University, 447-1 Wolgye-Dong, Nowon-Gu, Seoul 139-701. Influence of plasma decay on emission of 147-nm ultraviolet light from discharge cells in the plasma display panel. United States: N. p., 2007. Web. doi:10.1063/1.2715545.
Uhm, Han S., Yoo, Naleum, Choi, Eun H., & PDP Research Center, Department of Electrophysics, Kwangwoon University, 447-1 Wolgye-Dong, Nowon-Gu, Seoul 139-701. Influence of plasma decay on emission of 147-nm ultraviolet light from discharge cells in the plasma display panel. United States. doi:10.1063/1.2715545.
Uhm, Han S., Yoo, Naleum, Choi, Eun H., and PDP Research Center, Department of Electrophysics, Kwangwoon University, 447-1 Wolgye-Dong, Nowon-Gu, Seoul 139-701. Sun . "Influence of plasma decay on emission of 147-nm ultraviolet light from discharge cells in the plasma display panel". United States. doi:10.1063/1.2715545.
@article{osti_20974946,
title = {Influence of plasma decay on emission of 147-nm ultraviolet light from discharge cells in the plasma display panel},
author = {Uhm, Han S. and Yoo, Naleum and Choi, Eun H. and PDP Research Center, Department of Electrophysics, Kwangwoon University, 447-1 Wolgye-Dong, Nowon-Gu, Seoul 139-701},
abstractNote = {The time profile of 147-nm light emission from a cell discharge of the plasma display panel is investigated in terms of the xenon mole fraction {chi} and the gas pressure p, including the important influences of the diffusion loss of the plasma and the three-body collisions of excited xenon atoms in the resonance state. The light emission profile dY/dt in time is analytically expressed in terms of the gas pressure and xenon mole fraction. The theoretical analysis indicates that the emission intensity increases from zero, reaches its peak, and then decreases, as time goes by. The peak emission intensity (dY/dt){sub p} and the corresponding emission time t{sub p} are obtained analytically in terms of the gas pressure p and xenon mole fraction {chi}. The total emission Y of 147-nm light during each discharge in the cells is proportional to the plasma decay time {tau}. The experimental data are remarkably consistent with the theoretical predictions.},
doi = {10.1063/1.2715545},
journal = {Physics of Plasmas},
number = 4,
volume = 14,
place = {United States},
year = {Sun Apr 15 00:00:00 EDT 2007},
month = {Sun Apr 15 00:00:00 EDT 2007}
}
  • Emission properties of the 173 nm lights from the electrical discharge cells of the plasma display panel are investigated. The dimer formation and a theoretical model of 173 nm emission are presented. It is shown that the diffusion loss of the excited xenon atoms in the metastable level is one of the most important population depreciation factor of excited xenon atoms. The decay time {tau}{sub d} of excited atom number increases from zero, reaches its peak, and then decreases to zero, as the gas pressure p increases from zero, agreeing well with experimental data. A simple analytical expression Y ofmore » the total emission intensity is described in terms of the diffusion loss d{sub f}, the three-body collision {eta}, the gas pressure p, and the xenon mole fraction {chi}. The emission intensity Y of 173 nm photon decreases with an increasing value of parameter d{sub f}. Moreover, the emission intensity Y increases drastically with an increasing value of the gas pressure p and the xenon mole fraction {chi}. Results from the theoretical model agree remarkably well with experimental data.« less
  • We present the influence of gas pressure and applied voltage on Xe excimer radiation from a microdielectric barrier discharge (micro-DBD) in Ne/Xe gas mixture for plasma display panel. Measurements show that the excimer radiation with the 172 nm band lines is strongly observed in the afterglow, and drastically increases with an increase in gas pressure and applied voltage. It is also found that for high gas pressure and low voltage, excimer molecule (Xe{sub 2}{sup *}) is efficiently produced because of less infrared emission from Xe excited atom. The reaction processes of Xe metastable atom (Xe{sub 1s5}{sup *}), which is amore » precursor for Xe{sub 2}{sup *}, are theoretically analyzed using a one-dimensional fluid model. Increasing gas pressure results in large excimer radiation due to the enhancement of the following three processes, i.e., the conversion process from Xe{sub 1s5}{sup *} to Xe{sub 2}{sup *}, the direct electron impact excitation from ground state to Xe{sub 1s5}{sup *}, and the collisional de-excitation process from upper level (Xe{sup **}) to Xe{sub 1s5}{sup *}. The simulation analytical result shows that for lower voltage, Xe{sub 1s5}{sup *} is efficiently produced due to the increase in the ratio of direct excitation to Xe{sub 1s5}{sup *} from ground state and the suppression of the stepwise ionization from Xe{sub 1s5}{sup *} by electron collisions. While for high voltage operation of micro-DBD, the recombination process with Xe molecular ion (Xe{sub 2}{sup +}) and electron contributes to the total excimer radiation, which can be responsible for the large excimer radiation observed in experiment.« less
  • We have previously reported biological effects of photolysis products of liquid water by 163-nm photons. The photon source was an electrodeless discharge lamp containing bromine. Recent follow-up experiments have revealed a far-uv contamination in the emission. The effective fluence rate in the range 230 to approximately 300 nm was estimated to be equivalent to 4.2 x 10/sup -2/ W/m/sup 2/ at 254 nm (that of 163 nm was 4.8 W/m/sup 2/). Although this amount is relatively small the absolute quantity can be important in biological experiments with materials very sensitive to far-uv radiation. Since the amount of far-uv contamination maymore » depend on various unspecified factors, a careful check of similar lamps is necessary before use as a source of 163-nm photons.« less
  • Test panel for three-dimensional observation in ac plasma display panel (PDP) has been fabricated and the spatiotemporal behavior of infrared and visible emissions has been experimentally investigated in sustain discharges. Considering the infrared and visible emissions from the cathode, the cathode fall region in ac PDP could be within 70 {mu}m in thicknesses. We measured the propagation speed of the sheath plasma to be 1.8 mm/{mu}s. In addition, the experimental result showed that an increasing sustain frequency from 100 to 250 kHz improved the plasma efficiency.
  • A capillary Z-pinch discharge light source for EUV lithography has been developed. Our device is equipped with a water-cooled ceramic capillary and electrodes, and a solid state pulsed power generator. A stacked static induction thyristors are used as switching elements, which enable high repetition rate operation of pulsed power supply. A magnetic switch is connected in series, which not only assists the semiconductor switch but also provides a preionization current. In the present study, EUV radiation emitted from pinching plasma in a xenon-filled capillary was quantitatively measured using an in-band calorimeter. Time-integrated in-band source image was also observed using amore » pinhole camera system. Furthermore, new electrode system using plasma jet has been developed.« less