skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Optimizing 13.5 nm laser-produced tin plasma emission as a function of laser wavelength

Abstract

Extreme ultraviolet lithography requires a light source at 13.5 nm to match the proposed multilayer optics reflectivity. The impact of wavelength and power density on the ion distribution and electron temperature in a laser-produced plasma is calculated for Nd:YAG and CO{sub 2} lasers. A steady-state figure of merit, calculated to optimize emission as a function of laser wavelength, shows an increase with a CO{sub 2} laser. The influence of reduced electron density in the CO{sub 2} laser-produced plasma is considered in a one-dimensional radiation transport model, where a more than twofold increase in conversion efficiency over that attainable with the Nd:YAG is predicted.

Authors:
; ; ; ;  [1]
  1. School of Physics, University College Dublin, Belfield, Dublin 4 (Ireland)
Publication Date:
OSTI Identifier:
20971895
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 90; Journal Issue: 18; Other Information: DOI: 10.1063/1.2735944; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; CARBON DIOXIDE LASERS; ELECTRON DENSITY; ELECTRON TEMPERATURE; EXTREME ULTRAVIOLET RADIATION; ION TEMPERATURE; LASER-PRODUCED PLASMA; LIGHT SOURCES; NEODYMIUM LASERS; ONE-DIMENSIONAL CALCULATIONS; OPTICS; OPTIMIZATION; PERFORMANCE; PLASMA DENSITY; PLASMA PRODUCTION; POWER DENSITY; RADIATION TRANSPORT; REFLECTIVITY; STEADY-STATE CONDITIONS; TIN; WAVELENGTHS

Citation Formats

White, J., Dunne, P., Hayden, P., O'Reilly, F., and O'Sullivan, G.. Optimizing 13.5 nm laser-produced tin plasma emission as a function of laser wavelength. United States: N. p., 2007. Web. doi:10.1063/1.2735944.
White, J., Dunne, P., Hayden, P., O'Reilly, F., & O'Sullivan, G.. Optimizing 13.5 nm laser-produced tin plasma emission as a function of laser wavelength. United States. doi:10.1063/1.2735944.
White, J., Dunne, P., Hayden, P., O'Reilly, F., and O'Sullivan, G.. Mon . "Optimizing 13.5 nm laser-produced tin plasma emission as a function of laser wavelength". United States. doi:10.1063/1.2735944.
@article{osti_20971895,
title = {Optimizing 13.5 nm laser-produced tin plasma emission as a function of laser wavelength},
author = {White, J. and Dunne, P. and Hayden, P. and O'Reilly, F. and O'Sullivan, G.},
abstractNote = {Extreme ultraviolet lithography requires a light source at 13.5 nm to match the proposed multilayer optics reflectivity. The impact of wavelength and power density on the ion distribution and electron temperature in a laser-produced plasma is calculated for Nd:YAG and CO{sub 2} lasers. A steady-state figure of merit, calculated to optimize emission as a function of laser wavelength, shows an increase with a CO{sub 2} laser. The influence of reduced electron density in the CO{sub 2} laser-produced plasma is considered in a one-dimensional radiation transport model, where a more than twofold increase in conversion efficiency over that attainable with the Nd:YAG is predicted.},
doi = {10.1063/1.2735944},
journal = {Applied Physics Letters},
number = 18,
volume = 90,
place = {United States},
year = {Mon Apr 30 00:00:00 EDT 2007},
month = {Mon Apr 30 00:00:00 EDT 2007}
}