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Title: Mass sensor for in situ monitoring of focused ion and electron beam induced processes

Abstract

A cantilever-based mass sensor for in situ monitoring of deposition and milling using focused ion and electron beams is presented. Carefully designed experiments allowed for mass measurements with a noise level of {+-}10 fg by tracking the resonance frequency of a temperature stabilized piezoresistive cantilever using phase locking. The authors report on measurements of precursor surface coverage, residence time, mass deposition rates, yields, and deposit density using the (CH{sub 3}){sub 3}PtCpCH{sub 3} precursor.

Authors:
; ; ; ;  [1];  [2];  [3];  [4];  [3]
  1. EMPA, Swiss Federal Laboratories for Materials Testing and Research, Materials and Nanomechanics Laboratory, Feuerwerkerstr. 39, CH-3602 Thun, Switzerland and Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Imaging and Applied Optics, CH-1015 Lausanne (Switzerland)
  2. (CSEM), Jaquet Droz 1, CH 2002 Neucha circumflex tel (Switzerland)
  3. (Switzerland)
  4. (EPFL), Institute of Imaging and Applied Optics, CH-1015 Lausanne (Switzerland)
Publication Date:
OSTI Identifier:
20971803
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 90; Journal Issue: 5; Other Information: DOI: 10.1063/1.2435611; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; DEPOSITION; DEPOSITS; ELECTRON BEAMS; ION BEAMS; MILLING; NOISE; RESONANCE

Citation Formats

Friedli, Vinzenz, Santschi, Christian, Michler, Johann, Hoffmann, Patrik, Utke, Ivo, Centre Suisse d'Electronique et de Microtechnique, EMPA, Swiss Federal Laboratories for Materials Testing and Research, Materials and Nanomechanics Laboratory, Feuerwerkerstr. 39, CH-3602 Thun, Ecole Polytechnique Federale de Lausanne, and EMPA, Swiss Federal Laboratories for Materials Testing and Research, Materials and Nanomechanics Laboratory, Feuerwerkerstr. 39, CH-3602 Thun. Mass sensor for in situ monitoring of focused ion and electron beam induced processes. United States: N. p., 2007. Web. doi:10.1063/1.2435611.
Friedli, Vinzenz, Santschi, Christian, Michler, Johann, Hoffmann, Patrik, Utke, Ivo, Centre Suisse d'Electronique et de Microtechnique, EMPA, Swiss Federal Laboratories for Materials Testing and Research, Materials and Nanomechanics Laboratory, Feuerwerkerstr. 39, CH-3602 Thun, Ecole Polytechnique Federale de Lausanne, & EMPA, Swiss Federal Laboratories for Materials Testing and Research, Materials and Nanomechanics Laboratory, Feuerwerkerstr. 39, CH-3602 Thun. Mass sensor for in situ monitoring of focused ion and electron beam induced processes. United States. doi:10.1063/1.2435611.
Friedli, Vinzenz, Santschi, Christian, Michler, Johann, Hoffmann, Patrik, Utke, Ivo, Centre Suisse d'Electronique et de Microtechnique, EMPA, Swiss Federal Laboratories for Materials Testing and Research, Materials and Nanomechanics Laboratory, Feuerwerkerstr. 39, CH-3602 Thun, Ecole Polytechnique Federale de Lausanne, and EMPA, Swiss Federal Laboratories for Materials Testing and Research, Materials and Nanomechanics Laboratory, Feuerwerkerstr. 39, CH-3602 Thun. Mon . "Mass sensor for in situ monitoring of focused ion and electron beam induced processes". United States. doi:10.1063/1.2435611.
@article{osti_20971803,
title = {Mass sensor for in situ monitoring of focused ion and electron beam induced processes},
author = {Friedli, Vinzenz and Santschi, Christian and Michler, Johann and Hoffmann, Patrik and Utke, Ivo and Centre Suisse d'Electronique et de Microtechnique and EMPA, Swiss Federal Laboratories for Materials Testing and Research, Materials and Nanomechanics Laboratory, Feuerwerkerstr. 39, CH-3602 Thun and Ecole Polytechnique Federale de Lausanne and EMPA, Swiss Federal Laboratories for Materials Testing and Research, Materials and Nanomechanics Laboratory, Feuerwerkerstr. 39, CH-3602 Thun},
abstractNote = {A cantilever-based mass sensor for in situ monitoring of deposition and milling using focused ion and electron beams is presented. Carefully designed experiments allowed for mass measurements with a noise level of {+-}10 fg by tracking the resonance frequency of a temperature stabilized piezoresistive cantilever using phase locking. The authors report on measurements of precursor surface coverage, residence time, mass deposition rates, yields, and deposit density using the (CH{sub 3}){sub 3}PtCpCH{sub 3} precursor.},
doi = {10.1063/1.2435611},
journal = {Applied Physics Letters},
number = 5,
volume = 90,
place = {United States},
year = {Mon Jan 29 00:00:00 EST 2007},
month = {Mon Jan 29 00:00:00 EST 2007}
}
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