skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Influence of the electron beam on electromigration measurements within a scanning electron microscope

Abstract

In situ electromigration studies on polycrystalline gold nanowires are performed using a high resolution scanning electron microscope. Simultaneously, the resistance of the gold nanowires is recorded during current stressing. The nanowires are prepared by electron beam lithography (EBL) and subsequent thermal evaporation of gold onto the resist mask. In a further EBL-process contact leads are attached to the gold nanowires to determine resistance changes of better than 5x10{sup -4}. The authors observe small resistance oscillations which occur during the scanning process. They show that these oscillations are due to the scanning process of the electron beam rather than founded on periodic changes of the void morphology.

Authors:
;  [1]
  1. Fachbereich Physik, Universitaet Duisburg-Essen, Lotharstrasse 1, 47057 Duisburg (Germany)
Publication Date:
OSTI Identifier:
20971791
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 90; Journal Issue: 4; Other Information: DOI: 10.1063/1.2432304; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ELECTRIC CONDUCTIVITY; ELECTRON BEAMS; ELECTROPHORESIS; EVAPORATION; GOLD; MORPHOLOGY; OSCILLATIONS; PERIODICITY; POLYCRYSTALS; QUANTUM WIRES; SCANNING ELECTRON MICROSCOPY

Citation Formats

Stahlmecke, B., and Dumpich, G.. Influence of the electron beam on electromigration measurements within a scanning electron microscope. United States: N. p., 2007. Web. doi:10.1063/1.2432304.
Stahlmecke, B., & Dumpich, G.. Influence of the electron beam on electromigration measurements within a scanning electron microscope. United States. doi:10.1063/1.2432304.
Stahlmecke, B., and Dumpich, G.. Mon . "Influence of the electron beam on electromigration measurements within a scanning electron microscope". United States. doi:10.1063/1.2432304.
@article{osti_20971791,
title = {Influence of the electron beam on electromigration measurements within a scanning electron microscope},
author = {Stahlmecke, B. and Dumpich, G.},
abstractNote = {In situ electromigration studies on polycrystalline gold nanowires are performed using a high resolution scanning electron microscope. Simultaneously, the resistance of the gold nanowires is recorded during current stressing. The nanowires are prepared by electron beam lithography (EBL) and subsequent thermal evaporation of gold onto the resist mask. In a further EBL-process contact leads are attached to the gold nanowires to determine resistance changes of better than 5x10{sup -4}. The authors observe small resistance oscillations which occur during the scanning process. They show that these oscillations are due to the scanning process of the electron beam rather than founded on periodic changes of the void morphology.},
doi = {10.1063/1.2432304},
journal = {Applied Physics Letters},
number = 4,
volume = 90,
place = {United States},
year = {Mon Jan 22 00:00:00 EST 2007},
month = {Mon Jan 22 00:00:00 EST 2007}
}