Development of dielectric barrier discharge plasma processing apparatus for mass spectrometry and thin film deposition
- Institut fuer Physik, Ernst-Moritz-Arndt-Universitaet Greifswald, Felix-Hausdorff-Strasse 6, 17489 Greifswald (Germany)
Cost effective and a very simple dielectric barrier discharge plasma processing apparatus for thin film deposition and mass spectroscopic analysis of organic gas mixture has been described. The interesting features of the apparatus are the construction of the dielectric electrodes made of aluminum oxide or alumina (Al{sub 2}O{sub 3}) and glass and the generation of high ignition voltage from the spark plug transformer taken from car. Metal capacitor is introduced in between ground and oscilloscope to measure the executing power during the discharge and the average electron density in the plasma region. The organic polymer films have been deposited on Si (100) substrate using several organic gas compositions. The experimental setup provides a unique drainage system from the reaction chamber controlled by a membrane pump to suck out and remove the poisonous gases or residuals (cyanogens, H-CN, CH{sub x}NH{sub 2}, etc.) which have been produced during the discharge of CH{sub 4}/N{sub 2} mixture.
- OSTI ID:
- 20953538
- Journal Information:
- Review of Scientific Instruments, Vol. 78, Issue 7; Other Information: DOI: 10.1063/1.2751408; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
- Country of Publication:
- United States
- Language:
- English
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