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Title: Design of a scanning probe microscope with advanced sample treatment capabilities: An atomic force microscope combined with a miniaturized inductively coupled plasma source

Abstract

We describe the design and performance of an atomic force microscope (AFM) combined with a miniaturized inductively coupled plasma source working at a radio frequency of 27.12 MHz. State-of-the-art scanning probe microscopes (SPMs) have limited in situ sample treatment capabilities. Aggressive treatments such as plasma etching or harsh treatments such as etching in aggressive liquids typically require the removal of the sample from the microscope. Consequently, time consuming procedures are required if the same sample spot has to be imaged after successive processing steps. We have developed a first prototype of a SPM which features a quasi in situ sample treatment using a modified commercial atomic force microscope. A sample holder is positioned in a special reactor chamber; the AFM tip can be retracted by several millimeters so that the chamber can be closed for a treatment procedure. Most importantly, after the treatment, the tip is moved back to the sample with a lateral drift per process step in the 20 nm regime. The performance of the prototype is characterized by consecutive plasma etching of a nanostructured polymer film.

Authors:
;  [1]
  1. Lehrstuhl fuer Physikalische Chemie II, Universitaet Bayreuth, Bayreuth 95440 (Germany)
Publication Date:
OSTI Identifier:
20953470
Resource Type:
Journal Article
Journal Name:
Review of Scientific Instruments
Additional Journal Information:
Journal Volume: 78; Journal Issue: 6; Other Information: DOI: 10.1063/1.2742623; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0034-6748
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; ATOMIC FORCE MICROSCOPY; DESIGN; ETCHING; FILMS; LIQUIDS; MHZ RANGE 01-100; MICROSCOPES; NANOSTRUCTURES; PERFORMANCE; PLASMA; POLYMERS; PROBES; RADIOWAVE RADIATION; SAMPLE HOLDERS

Citation Formats

Hund, Markus, Herold, Hans, and Zentrale Technik, Elektronik, Universitaet Bayreuth, Bayreuth 95440. Design of a scanning probe microscope with advanced sample treatment capabilities: An atomic force microscope combined with a miniaturized inductively coupled plasma source. United States: N. p., 2007. Web. doi:10.1063/1.2742623.
Hund, Markus, Herold, Hans, & Zentrale Technik, Elektronik, Universitaet Bayreuth, Bayreuth 95440. Design of a scanning probe microscope with advanced sample treatment capabilities: An atomic force microscope combined with a miniaturized inductively coupled plasma source. United States. https://doi.org/10.1063/1.2742623
Hund, Markus, Herold, Hans, and Zentrale Technik, Elektronik, Universitaet Bayreuth, Bayreuth 95440. 2007. "Design of a scanning probe microscope with advanced sample treatment capabilities: An atomic force microscope combined with a miniaturized inductively coupled plasma source". United States. https://doi.org/10.1063/1.2742623.
@article{osti_20953470,
title = {Design of a scanning probe microscope with advanced sample treatment capabilities: An atomic force microscope combined with a miniaturized inductively coupled plasma source},
author = {Hund, Markus and Herold, Hans and Zentrale Technik, Elektronik, Universitaet Bayreuth, Bayreuth 95440},
abstractNote = {We describe the design and performance of an atomic force microscope (AFM) combined with a miniaturized inductively coupled plasma source working at a radio frequency of 27.12 MHz. State-of-the-art scanning probe microscopes (SPMs) have limited in situ sample treatment capabilities. Aggressive treatments such as plasma etching or harsh treatments such as etching in aggressive liquids typically require the removal of the sample from the microscope. Consequently, time consuming procedures are required if the same sample spot has to be imaged after successive processing steps. We have developed a first prototype of a SPM which features a quasi in situ sample treatment using a modified commercial atomic force microscope. A sample holder is positioned in a special reactor chamber; the AFM tip can be retracted by several millimeters so that the chamber can be closed for a treatment procedure. Most importantly, after the treatment, the tip is moved back to the sample with a lateral drift per process step in the 20 nm regime. The performance of the prototype is characterized by consecutive plasma etching of a nanostructured polymer film.},
doi = {10.1063/1.2742623},
url = {https://www.osti.gov/biblio/20953470}, journal = {Review of Scientific Instruments},
issn = {0034-6748},
number = 6,
volume = 78,
place = {United States},
year = {Fri Jun 15 00:00:00 EDT 2007},
month = {Fri Jun 15 00:00:00 EDT 2007}
}