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Title: Low-energy linear oxygen plasma source

Abstract

A new version of a constricted plasma source is described, characterized by all metal-ceramic construction, a linear slit exit of 180 mm length, and cw operation (typically 50 kHz) at an average power of 1.5 kW. The plasma source is here operated with oxygen gas, producing streaming plasma that contains mainly positive molecular and atomic ions, and to a much lesser degree, negative ions. The maximum total ion current obtained was about 0.5 A. The fraction of atomic ions reached more than 10% of all ions when the flow rate was less then 10 SCCM O{sub 2}, corresponding to a chamber pressure of about 0.5 Pa for the selected pumping speed. The energy distribution functions of the different ion species were measured with a combined mass spectrometer and energy analyzer. The time-averaged distribution functions were broad and ranged from about 30 to 90 eV at 200 kHz and higher frequencies, while they were only several eV broad at 50 kHz and lower frequencies, with the maximum located at about 40 eV for the grounded anode case. This maximum was shifted down to about 7 eV when the anode was floating, indicating the important role of the plasma potential for themore » ion energy for a given substrate potential. The source could be scaled to greater length and may be useful for functionalization of surfaces and plasma-assisted deposition of compound films.« less

Authors:
;  [1];  [2]
  1. Lawrence Berkeley National Laboratory, University of California, 1 Cyclotron Road, Berkeley, California 94720 (United States)
  2. (Russian Federation)
Publication Date:
OSTI Identifier:
20953412
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 78; Journal Issue: 4; Other Information: DOI: 10.1063/1.2723753; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ANIONS; ANODES; ATOMIC IONS; CERAMICS; CURRENTS; DEPOSITION; DISTRIBUTION FUNCTIONS; ENERGY SPECTRA; FILMS; FLOW RATE; KHZ RANGE 100-1000; LENGTH; MASS SPECTROMETERS; METALS; OXYGEN; PLASMA; PLASMA POTENTIAL

Citation Formats

Anders, Andre, Yushkov, George Yu., and High Current Electronics Institute, Russian Academy of Sciences, 4 Academichesky Avenue, Tomsk 634055. Low-energy linear oxygen plasma source. United States: N. p., 2007. Web. doi:10.1063/1.2723753.
Anders, Andre, Yushkov, George Yu., & High Current Electronics Institute, Russian Academy of Sciences, 4 Academichesky Avenue, Tomsk 634055. Low-energy linear oxygen plasma source. United States. doi:10.1063/1.2723753.
Anders, Andre, Yushkov, George Yu., and High Current Electronics Institute, Russian Academy of Sciences, 4 Academichesky Avenue, Tomsk 634055. Sun . "Low-energy linear oxygen plasma source". United States. doi:10.1063/1.2723753.
@article{osti_20953412,
title = {Low-energy linear oxygen plasma source},
author = {Anders, Andre and Yushkov, George Yu. and High Current Electronics Institute, Russian Academy of Sciences, 4 Academichesky Avenue, Tomsk 634055},
abstractNote = {A new version of a constricted plasma source is described, characterized by all metal-ceramic construction, a linear slit exit of 180 mm length, and cw operation (typically 50 kHz) at an average power of 1.5 kW. The plasma source is here operated with oxygen gas, producing streaming plasma that contains mainly positive molecular and atomic ions, and to a much lesser degree, negative ions. The maximum total ion current obtained was about 0.5 A. The fraction of atomic ions reached more than 10% of all ions when the flow rate was less then 10 SCCM O{sub 2}, corresponding to a chamber pressure of about 0.5 Pa for the selected pumping speed. The energy distribution functions of the different ion species were measured with a combined mass spectrometer and energy analyzer. The time-averaged distribution functions were broad and ranged from about 30 to 90 eV at 200 kHz and higher frequencies, while they were only several eV broad at 50 kHz and lower frequencies, with the maximum located at about 40 eV for the grounded anode case. This maximum was shifted down to about 7 eV when the anode was floating, indicating the important role of the plasma potential for the ion energy for a given substrate potential. The source could be scaled to greater length and may be useful for functionalization of surfaces and plasma-assisted deposition of compound films.},
doi = {10.1063/1.2723753},
journal = {Review of Scientific Instruments},
number = 4,
volume = 78,
place = {United States},
year = {Sun Apr 15 00:00:00 EDT 2007},
month = {Sun Apr 15 00:00:00 EDT 2007}
}