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Title: Electrical characterization of a capacitive rf plasma sheath

Abstract

The authors report on an experimental system designed to investigate and characterize capacitive radio frequency (rf) sheaths. An electrode mounted in an inductive plasma reactor and driven with separate rf and direct current (dc) power sources is used. The advantage of this design is that the electrode sheath is decoupled from the plasma parameters. This allows detailed investigation of the sheath with different bias conditions without perturbing the bulk plasma parameters. Power coupled to ions and electrons through the sheath, at low pressure, is investigated and a method to determine the electron conduction current to the electrode, using the external dc bias, is presented.

Authors:
;  [1]
  1. National Center for Plasma Science and Technology, School of Physical Sciences, Dublin City University, Glasnevin, Dublin 9 (Ireland)
Publication Date:
OSTI Identifier:
20953248
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 78; Journal Issue: 1; Other Information: DOI: 10.1063/1.2430679; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; DESIGN; DIRECT CURRENT; ELECTRODES; ELECTRONS; HIGH-FREQUENCY DISCHARGES; IONS; PLASMA; PLASMA DIAGNOSTICS; PLASMA SHEATH; RADIOWAVE RADIATION

Citation Formats

Gahan, D., and Hopkins, M. B. Electrical characterization of a capacitive rf plasma sheath. United States: N. p., 2007. Web. doi:10.1063/1.2430679.
Gahan, D., & Hopkins, M. B. Electrical characterization of a capacitive rf plasma sheath. United States. doi:10.1063/1.2430679.
Gahan, D., and Hopkins, M. B. Mon . "Electrical characterization of a capacitive rf plasma sheath". United States. doi:10.1063/1.2430679.
@article{osti_20953248,
title = {Electrical characterization of a capacitive rf plasma sheath},
author = {Gahan, D. and Hopkins, M. B.},
abstractNote = {The authors report on an experimental system designed to investigate and characterize capacitive radio frequency (rf) sheaths. An electrode mounted in an inductive plasma reactor and driven with separate rf and direct current (dc) power sources is used. The advantage of this design is that the electrode sheath is decoupled from the plasma parameters. This allows detailed investigation of the sheath with different bias conditions without perturbing the bulk plasma parameters. Power coupled to ions and electrons through the sheath, at low pressure, is investigated and a method to determine the electron conduction current to the electrode, using the external dc bias, is presented.},
doi = {10.1063/1.2430679},
journal = {Review of Scientific Instruments},
number = 1,
volume = 78,
place = {United States},
year = {Mon Jan 15 00:00:00 EST 2007},
month = {Mon Jan 15 00:00:00 EST 2007}
}