Atomic force microscopy characterization of Zerodur mirror substrates for the extreme ultraviolet telescopes aboard NASA's Solar Dynamics Observatory

Journal Article · Fri Jun 01 00:00:00 EDT 2007 · Applied Optics

DOI:https://doi.org/10.1364/AO.46.003156· OSTI ID:20929738

Soufli, Regina; Baker, Sherry L; Windt, David L; Gullikson, Eric M; Robinson, Jeff C; Podgorski, William A; Golub, Leon

The high-spatial frequency roughness of a mirror operating at extreme ultraviolet (EUV)wavelengths is crucial for the reflective performance and is subject to very stringent specifications. To understand and predict mirror performance, precision metrology is required for measuring the surface roughness. Zerodur mirror substrates made by two different polishing vendors for a suite of EUV telescopes for solar physics were characterized by atomic force microscopy (AFM). The AFM measurements revealed features in the topography of each substrate that are associated with specific polishing techniques. Theoretical predictions of the mirror performance based on the AFM-measured high-spatial-frequency roughness are in good agreement with EUV reflectance measurements of the mirrors after multilayer coating.

• OSTI ID: 20929738
• Journal Information: Applied Optics, Vol. 46, Issue 16; Other Information: DOI: 10.1364/AO.46.003156; (c) 2007 Optical Society of America; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6935
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
36 MATERIALS SCIENCE
ACCURACY
ATOMIC FORCE MICROSCOPY
EXTREME ULTRAVIOLET RADIATION
MIRRORS
NASA
OPTICAL PROPERTIES
OPTICS
PERFORMANCE
POLISHING
ROUGHNESS
SPECIFICATIONS
SUBSTRATES
SURFACE COATING
TELESCOPES
TEXTURE
THIN FILMS
TOPOGRAPHY
WAVELENGTHS