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Title: Nickel atom and ion densities in an inductively coupled plasma with an internal coil

Abstract

The nickel atom density was measured in an inductively coupled argon plasma with an internal Ni coil, as a function of pressure and power, using optical absorption spectroscopy. Nickel atoms were sputtered from the coil and from a separate Ni target under optional target bias. A fraction of the atoms was ionized in the high-density plasma. The gas temperature was determined by analyzing the rovibrational spectra of the second positive system of nitrogen actinometer gas. The electron density was determined by optical emission spectroscopy in combination with a global model. For a pressure of 8-20 mTorr and coil power of 40-200 W, the Ni atom density ranged from 2.7x10{sup 9} to 1.5x10{sup 10} cm{sup -3}, increasing strongly with pressure. The Ni atom density first increased with power but saturated at high power levels. The measured Ni atom density agreed fairly well with the predictions of a global model, in particular, at the higher pressures. The model also predicted that the Ni{sup +} ion density greatly increased at higher powers and pressures. Applying 70 W bias on the target electrode increased the Ni atom density by 60%.

Authors:
; ; ;  [1];  [2];  [3]
  1. Plasma Processing Laboratory, Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204-4004 (United States)
  2. (France)
  3. (United States)
Publication Date:
OSTI Identifier:
20884960
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 101; Journal Issue: 1; Other Information: DOI: 10.1063/1.2401659; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ABSORPTION SPECTROSCOPY; ARGON; ELECTRODES; ELECTRON DENSITY; ELECTRON TEMPERATURE; EMISSION SPECTROSCOPY; ION DENSITY; IONIZATION; NICKEL; NICKEL IONS; NITROGEN; PLASMA; PLASMA DENSITY; PLASMA DIAGNOSTICS; PRESSURE DEPENDENCE; PRESSURE RANGE PA

Citation Formats

Xu Lin, Sadeghi, Nader, Donnelly, Vincent M., Economou, Demetre J., Laboratoire de Spectrometrie Physique, University Joseph Fourier-Grenoble and CNRS, 38042, Grenoble, and Plasma Processing Laboratory, Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204-4004. Nickel atom and ion densities in an inductively coupled plasma with an internal coil. United States: N. p., 2007. Web. doi:10.1063/1.2401659.
Xu Lin, Sadeghi, Nader, Donnelly, Vincent M., Economou, Demetre J., Laboratoire de Spectrometrie Physique, University Joseph Fourier-Grenoble and CNRS, 38042, Grenoble, & Plasma Processing Laboratory, Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204-4004. Nickel atom and ion densities in an inductively coupled plasma with an internal coil. United States. doi:10.1063/1.2401659.
Xu Lin, Sadeghi, Nader, Donnelly, Vincent M., Economou, Demetre J., Laboratoire de Spectrometrie Physique, University Joseph Fourier-Grenoble and CNRS, 38042, Grenoble, and Plasma Processing Laboratory, Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204-4004. Mon . "Nickel atom and ion densities in an inductively coupled plasma with an internal coil". United States. doi:10.1063/1.2401659.
@article{osti_20884960,
title = {Nickel atom and ion densities in an inductively coupled plasma with an internal coil},
author = {Xu Lin and Sadeghi, Nader and Donnelly, Vincent M. and Economou, Demetre J. and Laboratoire de Spectrometrie Physique, University Joseph Fourier-Grenoble and CNRS, 38042, Grenoble and Plasma Processing Laboratory, Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204-4004},
abstractNote = {The nickel atom density was measured in an inductively coupled argon plasma with an internal Ni coil, as a function of pressure and power, using optical absorption spectroscopy. Nickel atoms were sputtered from the coil and from a separate Ni target under optional target bias. A fraction of the atoms was ionized in the high-density plasma. The gas temperature was determined by analyzing the rovibrational spectra of the second positive system of nitrogen actinometer gas. The electron density was determined by optical emission spectroscopy in combination with a global model. For a pressure of 8-20 mTorr and coil power of 40-200 W, the Ni atom density ranged from 2.7x10{sup 9} to 1.5x10{sup 10} cm{sup -3}, increasing strongly with pressure. The Ni atom density first increased with power but saturated at high power levels. The measured Ni atom density agreed fairly well with the predictions of a global model, in particular, at the higher pressures. The model also predicted that the Ni{sup +} ion density greatly increased at higher powers and pressures. Applying 70 W bias on the target electrode increased the Ni atom density by 60%.},
doi = {10.1063/1.2401659},
journal = {Journal of Applied Physics},
number = 1,
volume = 101,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 2007},
month = {Mon Jan 01 00:00:00 EST 2007}
}