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Title: Particle emission from tantalum plasma produced by 532 nm laser pulse ablation

Abstract

A study of visible laser ablation of tantalum in vacuum by using 3 ns Nd:YAG laser radiation at high pulse energy is reported. Nanosecond pulsed ablation, at an intensity on the order of 10{sup 9} W/cm{sup 2}, produces high nonisotropic emission of neutrals and ionic species. Mass quadrupole spectrometry, coupled to electrostatic ion deflection, allows estimation of the energy distributions of the emitted species within the plume as a function of the incident laser energy. Neutrals show typical Boltzmann distributions while ions show Coulomb-Boltzmann-shifted distributions depending on their charge state. Surface profiles of the craters and microscopy investigations permitted to study the ablation threshold, ablation yields, and deposition rates of thin films on silicon substrates. The multicomponent structure of the plume emission is rationalized in terms of charge state, ion and neutral equivalent temperatures, and plasma density. A special regard is given to the ion acceleration process occurring inside the plasma due to the high electrical field generated at the nonequilibrium plasma conditions. The angular distributions of the neutral and ion species are also presented and discussed.

Authors:
; ; ; ;  [1]
  1. Dipartimento di Fisica, Universita di Messina, Contrada Papardo 31, 98100 Messina (Italy) and INFN-Laboratori Nazionali del Sud, Via S. Sofia 44, 95173 Catania (Italy)
Publication Date:
OSTI Identifier:
20884797
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 100; Journal Issue: 9; Other Information: DOI: 10.1063/1.2358400; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ABLATION; ALUMINIUM OXIDES; ANGULAR DISTRIBUTION; CHARGE STATES; ELECTRON TEMPERATURE; ENERGY BEAM DEPOSITION; ENERGY SPECTRA; LASER RADIATION; LASERS; NON-EQUILIBRIUM PLASMA; PLASMA DENSITY; PLASMA DIAGNOSTICS; PLASMA PRODUCTION; PULSED IRRADIATION; PULSES; QUADRUPOLES; SILICON; TANTALUM; THIN FILMS; YTTRIUM COMPOUNDS

Citation Formats

Torrisi, L, Caridi, F, Picciotto, A, Margarone, D, Borrielli, A, and Dipartimento di Fisica, Universita di Messina, Contrada Papardo 31, 98100 Messina. Particle emission from tantalum plasma produced by 532 nm laser pulse ablation. United States: N. p., 2006. Web. doi:10.1063/1.2358400.
Torrisi, L, Caridi, F, Picciotto, A, Margarone, D, Borrielli, A, & Dipartimento di Fisica, Universita di Messina, Contrada Papardo 31, 98100 Messina. Particle emission from tantalum plasma produced by 532 nm laser pulse ablation. United States. https://doi.org/10.1063/1.2358400
Torrisi, L, Caridi, F, Picciotto, A, Margarone, D, Borrielli, A, and Dipartimento di Fisica, Universita di Messina, Contrada Papardo 31, 98100 Messina. Wed . "Particle emission from tantalum plasma produced by 532 nm laser pulse ablation". United States. https://doi.org/10.1063/1.2358400.
@article{osti_20884797,
title = {Particle emission from tantalum plasma produced by 532 nm laser pulse ablation},
author = {Torrisi, L and Caridi, F and Picciotto, A and Margarone, D and Borrielli, A and Dipartimento di Fisica, Universita di Messina, Contrada Papardo 31, 98100 Messina},
abstractNote = {A study of visible laser ablation of tantalum in vacuum by using 3 ns Nd:YAG laser radiation at high pulse energy is reported. Nanosecond pulsed ablation, at an intensity on the order of 10{sup 9} W/cm{sup 2}, produces high nonisotropic emission of neutrals and ionic species. Mass quadrupole spectrometry, coupled to electrostatic ion deflection, allows estimation of the energy distributions of the emitted species within the plume as a function of the incident laser energy. Neutrals show typical Boltzmann distributions while ions show Coulomb-Boltzmann-shifted distributions depending on their charge state. Surface profiles of the craters and microscopy investigations permitted to study the ablation threshold, ablation yields, and deposition rates of thin films on silicon substrates. The multicomponent structure of the plume emission is rationalized in terms of charge state, ion and neutral equivalent temperatures, and plasma density. A special regard is given to the ion acceleration process occurring inside the plasma due to the high electrical field generated at the nonequilibrium plasma conditions. The angular distributions of the neutral and ion species are also presented and discussed.},
doi = {10.1063/1.2358400},
url = {https://www.osti.gov/biblio/20884797}, journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 9,
volume = 100,
place = {United States},
year = {2006},
month = {11}
}