Molybdenum angular sputtering distribution under low energy xenon ion bombardment
- Center for Energy Research, University of California at San Diego, La Jolla, California 92093 (United States)
The molybdenum angular sputtering distribution is measured during xenon ion bombardment from a plasma, with incident ion energy E{sub Xe} ranging between 75 and 225 eV. A quadrupole mass spectrometer (QMS) is used to detect the fraction of sputtered neutrals that is ionized in the plasma and to obtain the angular distribution by changing the angle {theta} between the target normal and the QMS aperture. The results obtained in these experiments are relative and normalized to the existing data in the literature. The angular sputtering distribution for molybdenum has a maximum at {theta}=60 deg., and this maximum becomes less pronounced as the incident ion energy increases. The dependence of the total sputtering yield on incident ion energy is in good agreement with previous experiments. There is an order of magnitude increase in the sputtering yield as E{sub Xe} is increased from 75 to 125 eV, and a more moderate increase for higher energies. The results of a simulation of the angular distribution of molybdenum atoms sputtered by xenon bombardment using a Monte Carlo code are also presented. They are in agreement with the experiments showing an ''under-cosine'' distribution (peaked at {theta}=45 deg. -60 deg.) for the lower energies which evolves towards a cosine distribution as the incident ion energy increases.
- OSTI ID:
- 20884719
- Journal Information:
- Journal of Applied Physics, Vol. 100, Issue 6; Other Information: DOI: 10.1063/1.2336502; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
Similar Records
Surface production of H{sup {minus}} ions by backscattering of low-energy protons
Effect of xenon bombardment on ruthenium-coated grazing incidence collector mirror lifetime for extreme ultraviolet lithography