skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Plasma-assisted atomic layer deposition of Al{sub 2}O{sub 3} moisture permeation barriers on polymers

Abstract

Thin Al{sub 2}O{sub 3} films of different thicknesses (10-40 nm) were deposited by plasma-assisted atomic layer deposition on substrates of poly(2,6-ethylenenaphthalate) (PEN), and the water vapor transmission rate (WVTR) values were measured by means of the calcium test. The permeation barrier properties improved with decreasing substrate temperature and a good WVTR of 5x10{sup -3} g m{sup -2} day{sup -1} (WVTR{sub PEN}=0.5 g m{sup -2} day{sup -1}) was measured for a 20 nm thick Al{sub 2}O{sub 3} film deposited at room temperature using short purging times. Such ultrathin, low-temperature deposited, high-quality moisture permeation barriers are an essential requirement for the implementation of polymeric substrates in flexible electronic and display applications.

Authors:
; ; ;  [1]
  1. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven (Netherlands)
Publication Date:
OSTI Identifier:
20883178
Resource Type:
Journal Article
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 89; Journal Issue: 8; Other Information: DOI: 10.1063/1.2338776; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0003-6951
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ALUMINIUM OXIDES; CALCIUM; DEPOSITION; LAYERS; MOISTURE; PERMEABILITY; PLASMA; POLYMERS; SUBSTRATES; TEMPERATURE RANGE 0273-0400 K; THICKNESS; THIN FILMS; WATER VAPOR

Citation Formats

Langereis, E, Creatore, M, Heil, S B. S., Sanden, M. C. M. van de, and Kessels, W M. M. Plasma-assisted atomic layer deposition of Al{sub 2}O{sub 3} moisture permeation barriers on polymers. United States: N. p., 2006. Web. doi:10.1063/1.2338776.
Langereis, E, Creatore, M, Heil, S B. S., Sanden, M. C. M. van de, & Kessels, W M. M. Plasma-assisted atomic layer deposition of Al{sub 2}O{sub 3} moisture permeation barriers on polymers. United States. doi:10.1063/1.2338776.
Langereis, E, Creatore, M, Heil, S B. S., Sanden, M. C. M. van de, and Kessels, W M. M. Mon . "Plasma-assisted atomic layer deposition of Al{sub 2}O{sub 3} moisture permeation barriers on polymers". United States. doi:10.1063/1.2338776.
@article{osti_20883178,
title = {Plasma-assisted atomic layer deposition of Al{sub 2}O{sub 3} moisture permeation barriers on polymers},
author = {Langereis, E and Creatore, M and Heil, S B. S. and Sanden, M. C. M. van de and Kessels, W M. M.},
abstractNote = {Thin Al{sub 2}O{sub 3} films of different thicknesses (10-40 nm) were deposited by plasma-assisted atomic layer deposition on substrates of poly(2,6-ethylenenaphthalate) (PEN), and the water vapor transmission rate (WVTR) values were measured by means of the calcium test. The permeation barrier properties improved with decreasing substrate temperature and a good WVTR of 5x10{sup -3} g m{sup -2} day{sup -1} (WVTR{sub PEN}=0.5 g m{sup -2} day{sup -1}) was measured for a 20 nm thick Al{sub 2}O{sub 3} film deposited at room temperature using short purging times. Such ultrathin, low-temperature deposited, high-quality moisture permeation barriers are an essential requirement for the implementation of polymeric substrates in flexible electronic and display applications.},
doi = {10.1063/1.2338776},
journal = {Applied Physics Letters},
issn = {0003-6951},
number = 8,
volume = 89,
place = {United States},
year = {2006},
month = {8}
}