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Title: Effect of dual frequency on the plasma characteristics in an internal linear inductively coupled plasma source

Abstract

An internal-type linear inductive antenna, referred to as a ''double comb-type antenna,'' was used as a large area plasma source with a substrate size of 880x660 mm{sup 2} (fourth generation glass size). The effects of the dual frequency (2 and 13.56 MHz) radio frequency (rf) power to the antenna as well as the power ratio on the plasma characteristics were investigated. High-density plasma on the order of 1.7x10{sup 11} cm{sup -3} could be obtained with a dual frequency power of 5 kW (13.56 MHz) and 1 kW (2 MHz) at a pressure of 15 mTorr Ar. This plasma density was lower than that obtained for the double comb-type antenna using a single frequency alone (5 kW, 13.56 MHz). However, the use of the dual frequency with a rf power ratio of approximately 1(2 MHz):5(13.56 MHz) showed better plasma uniformity than that obtained using the single frequency. Plasma uniformity of 6.1% could be obtained over the substrate area. Simulations using FL2L code confirmed the improvement in the plasma uniformity using the dual frequency to the double comb-type antenna.

Authors:
; ; ; ;  [1];  [2]
  1. Department of Materials Science and Engineering, Sungkyunkwan University, Suwon, Kyunggi-do 440-746 (Korea, Republic of)
  2. (Korea, Republic of)
Publication Date:
OSTI Identifier:
20880179
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 89; Journal Issue: 25; Other Information: DOI: 10.1063/1.2405417; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ANTENNAS; ARGON; GLASS; MHZ RANGE 01-100; PLASMA; PLASMA DENSITY; PLASMA SIMULATION; RADIOWAVE RADIATION; SUBSTRATES; WALL EFFECTS

Citation Formats

Kim, K. N., Lim, J. H., Yeom, G. Y., Lee, S. H., Lee, J. K., and Department of Electronic and Electrical Engineering, Pohang University of Science and Technology, Pohang 790-784. Effect of dual frequency on the plasma characteristics in an internal linear inductively coupled plasma source. United States: N. p., 2006. Web. doi:10.1063/1.2405417.
Kim, K. N., Lim, J. H., Yeom, G. Y., Lee, S. H., Lee, J. K., & Department of Electronic and Electrical Engineering, Pohang University of Science and Technology, Pohang 790-784. Effect of dual frequency on the plasma characteristics in an internal linear inductively coupled plasma source. United States. doi:10.1063/1.2405417.
Kim, K. N., Lim, J. H., Yeom, G. Y., Lee, S. H., Lee, J. K., and Department of Electronic and Electrical Engineering, Pohang University of Science and Technology, Pohang 790-784. Mon . "Effect of dual frequency on the plasma characteristics in an internal linear inductively coupled plasma source". United States. doi:10.1063/1.2405417.
@article{osti_20880179,
title = {Effect of dual frequency on the plasma characteristics in an internal linear inductively coupled plasma source},
author = {Kim, K. N. and Lim, J. H. and Yeom, G. Y. and Lee, S. H. and Lee, J. K. and Department of Electronic and Electrical Engineering, Pohang University of Science and Technology, Pohang 790-784},
abstractNote = {An internal-type linear inductive antenna, referred to as a ''double comb-type antenna,'' was used as a large area plasma source with a substrate size of 880x660 mm{sup 2} (fourth generation glass size). The effects of the dual frequency (2 and 13.56 MHz) radio frequency (rf) power to the antenna as well as the power ratio on the plasma characteristics were investigated. High-density plasma on the order of 1.7x10{sup 11} cm{sup -3} could be obtained with a dual frequency power of 5 kW (13.56 MHz) and 1 kW (2 MHz) at a pressure of 15 mTorr Ar. This plasma density was lower than that obtained for the double comb-type antenna using a single frequency alone (5 kW, 13.56 MHz). However, the use of the dual frequency with a rf power ratio of approximately 1(2 MHz):5(13.56 MHz) showed better plasma uniformity than that obtained using the single frequency. Plasma uniformity of 6.1% could be obtained over the substrate area. Simulations using FL2L code confirmed the improvement in the plasma uniformity using the dual frequency to the double comb-type antenna.},
doi = {10.1063/1.2405417},
journal = {Applied Physics Letters},
number = 25,
volume = 89,
place = {United States},
year = {Mon Dec 18 00:00:00 EST 2006},
month = {Mon Dec 18 00:00:00 EST 2006}
}