Diffraction-aided laser-induced microstructuring of thin TiO{sub 2} films on glass

Journal Article · Mon Oct 16 00:00:00 EDT 2006 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2364462· OSTI ID:20880030

Overschelde, O van; Wautelet, M ^[1]

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1. Condensed Matter Physics, University of Mons-Hainaut, 23 Avenue Maistriau, B-7000 Mons (Belgium)

Thin films of TiO{sub 2} are deposited by magnetron sputtering on glass substrate and are irradiated by ultraviolet radiation using a KrF excimer laser. These thin films are patterned with a razor blade placed in the way of the radiation. When the fluence is in the 1250-1550 mJ/cm{sup 2} range, a regular structure appears, with controlled ablation of the films. It is shown that above a critical local fluence, the ablated depth varies linearly with the local fluence. The proportionality factor is shown to be equal to two photons per evaporated molecule.

• OSTI ID: 20880030
• Journal Information: Applied Physics Letters, Vol. 89, Issue 16; Other Information: DOI: 10.1063/1.2364462; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ABLATION
DEPOSITION
DIFFRACTION
GLASS
KRYPTON FLUORIDE LASERS
PHOTONS
SPUTTERING
SUBSTRATES
THIN FILMS
TITANIUM OXIDES
ULTRAVIOLET RADIATION